JPS51123739A - Silicon etching process - Google Patents

Silicon etching process

Info

Publication number
JPS51123739A
JPS51123739A JP4881675A JP4881675A JPS51123739A JP S51123739 A JPS51123739 A JP S51123739A JP 4881675 A JP4881675 A JP 4881675A JP 4881675 A JP4881675 A JP 4881675A JP S51123739 A JPS51123739 A JP S51123739A
Authority
JP
Japan
Prior art keywords
etching process
silicon etching
silicon
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4881675A
Other languages
English (en)
Inventor
Yasunari Kajiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4881675A priority Critical patent/JPS51123739A/ja
Publication of JPS51123739A publication Critical patent/JPS51123739A/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
JP4881675A 1975-04-22 1975-04-22 Silicon etching process Pending JPS51123739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4881675A JPS51123739A (en) 1975-04-22 1975-04-22 Silicon etching process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4881675A JPS51123739A (en) 1975-04-22 1975-04-22 Silicon etching process

Publications (1)

Publication Number Publication Date
JPS51123739A true JPS51123739A (en) 1976-10-28

Family

ID=12813724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4881675A Pending JPS51123739A (en) 1975-04-22 1975-04-22 Silicon etching process

Country Status (1)

Country Link
JP (1) JPS51123739A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53124978A (en) * 1977-04-07 1978-10-31 Fujitsu Ltd Etching solution of semiconductive film
US6316370B1 (en) 1999-04-05 2001-11-13 Micron Technology, Inc. Method for etching doped polysilicon with high selectivity to undoped polysilicon
CN103409808A (zh) * 2013-09-04 2013-11-27 常州时创能源科技有限公司 多晶硅片制绒添加剂及其使用方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53124978A (en) * 1977-04-07 1978-10-31 Fujitsu Ltd Etching solution of semiconductive film
US6316370B1 (en) 1999-04-05 2001-11-13 Micron Technology, Inc. Method for etching doped polysilicon with high selectivity to undoped polysilicon
US6833084B2 (en) * 1999-04-05 2004-12-21 Micron Technology, Inc. Etching compositions
CN103409808A (zh) * 2013-09-04 2013-11-27 常州时创能源科技有限公司 多晶硅片制绒添加剂及其使用方法

Similar Documents

Publication Publication Date Title
JPS51132972A (en) Method of etching
JPS5259678A (en) Etching solution
JPS5236979A (en) Method of etching
GB1542651A (en) Semiconductor devices
IE41425L (en) Etching process
ZA766145B (en) Semiconductor devices
GB1548877A (en) Semiconductor devices
GB1539700A (en) Process for etching sio2
GB1553417A (en) Semiconductor device manufacture
GB1552161A (en) Semiconductor devices
GB1555037A (en) Etching processes
GB1554273A (en) Semiconductor device manufacture
GB1540450A (en) Self-aligning double polycrystalline silicon etching process
JPS529648A (en) Method of selectively ionnetching silicon
ZA761368B (en) Integrated reaction process
JPS5231035A (en) Organic silicon compounds and manufacturing process therefor
GB1553243A (en) Semiconductor
JPS5222878A (en) Process for silicon semiconductor devices
HK14980A (en) Semiconductor devices
JPS51117136A (en) Plasma etching process
JPS5283179A (en) Semiconductor
JPS51123739A (en) Silicon etching process
JPS5245550A (en) Etching liquid
JPS51112445A (en) Gas etching means
GB1557808A (en) Semiconductor device manufacture