JPS53124978A - Etching solution of semiconductive film - Google Patents

Etching solution of semiconductive film

Info

Publication number
JPS53124978A
JPS53124978A JP3899977A JP3899977A JPS53124978A JP S53124978 A JPS53124978 A JP S53124978A JP 3899977 A JP3899977 A JP 3899977A JP 3899977 A JP3899977 A JP 3899977A JP S53124978 A JPS53124978 A JP S53124978A
Authority
JP
Japan
Prior art keywords
etching solution
semiconductive film
film
discoloration
letting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3899977A
Other languages
Japanese (ja)
Inventor
Masuji Sato
Takao Furuumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3899977A priority Critical patent/JPS53124978A/en
Publication of JPS53124978A publication Critical patent/JPS53124978A/en
Pending legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)
  • Light Receiving Elements (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To eliminate peeling of film and discoloration at the patterned film end parts by letting an etching solution containing hydrochloric acid and hydrogen peroxide contain one or more kinds selected from ethylene glycol and polyethylene glycol.
COPYRIGHT: (C)1978,JPO&Japio
JP3899977A 1977-04-07 1977-04-07 Etching solution of semiconductive film Pending JPS53124978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3899977A JPS53124978A (en) 1977-04-07 1977-04-07 Etching solution of semiconductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3899977A JPS53124978A (en) 1977-04-07 1977-04-07 Etching solution of semiconductive film

Publications (1)

Publication Number Publication Date
JPS53124978A true JPS53124978A (en) 1978-10-31

Family

ID=12540818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3899977A Pending JPS53124978A (en) 1977-04-07 1977-04-07 Etching solution of semiconductive film

Country Status (1)

Country Link
JP (1) JPS53124978A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5688366A (en) * 1994-04-28 1997-11-18 Canon Kabushiki Kaisha Etching method, method of producing a semiconductor device, and etchant therefor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51123739A (en) * 1975-04-22 1976-10-28 Mitsubishi Electric Corp Silicon etching process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51123739A (en) * 1975-04-22 1976-10-28 Mitsubishi Electric Corp Silicon etching process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5688366A (en) * 1994-04-28 1997-11-18 Canon Kabushiki Kaisha Etching method, method of producing a semiconductor device, and etchant therefor

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