JPS5094879A - - Google Patents
Info
- Publication number
- JPS5094879A JPS5094879A JP14332874A JP14332874A JPS5094879A JP S5094879 A JPS5094879 A JP S5094879A JP 14332874 A JP14332874 A JP 14332874A JP 14332874 A JP14332874 A JP 14332874A JP S5094879 A JPS5094879 A JP S5094879A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/20—Doping by irradiation with electromagnetic waves or by particle radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/261—Bombardment with radiation to produce a nuclear reaction transmuting chemical elements
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2362320A DE2362320A1 (en) | 1973-12-14 | 1973-12-14 | Homogeneous doping of silicon monocrystals - by controlled irradiation with thermal neutrons to give desired position and intensity of doping |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5094879A true JPS5094879A (en) | 1975-07-28 |
Family
ID=5900820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14332874A Pending JPS5094879A (en) | 1973-12-14 | 1974-12-13 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5094879A (en) |
DE (1) | DE2362320A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52109865A (en) * | 1976-03-12 | 1977-09-14 | Nippon Telegr & Teleph Corp <Ntt> | Inpurity adding method to silicon |
JPS62226897A (en) * | 1986-03-27 | 1987-10-05 | Komatsu Denshi Kinzoku Kk | Production of single crystal |
JP2007176725A (en) * | 2005-12-27 | 2007-07-12 | Shin Etsu Handotai Co Ltd | Method for manufacturing neutron-irradiated silicon single crystal |
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1973
- 1973-12-14 DE DE2362320A patent/DE2362320A1/en active Pending
-
1974
- 1974-12-13 JP JP14332874A patent/JPS5094879A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52109865A (en) * | 1976-03-12 | 1977-09-14 | Nippon Telegr & Teleph Corp <Ntt> | Inpurity adding method to silicon |
JPS5328741B2 (en) * | 1976-03-12 | 1978-08-16 | ||
JPS62226897A (en) * | 1986-03-27 | 1987-10-05 | Komatsu Denshi Kinzoku Kk | Production of single crystal |
JP2007176725A (en) * | 2005-12-27 | 2007-07-12 | Shin Etsu Handotai Co Ltd | Method for manufacturing neutron-irradiated silicon single crystal |
Also Published As
Publication number | Publication date |
---|---|
DE2362320A1 (en) | 1975-06-19 |