JPS5083103A - - Google Patents
Info
- Publication number
- JPS5083103A JPS5083103A JP11569174A JP11569174A JPS5083103A JP S5083103 A JPS5083103 A JP S5083103A JP 11569174 A JP11569174 A JP 11569174A JP 11569174 A JP11569174 A JP 11569174A JP S5083103 A JPS5083103 A JP S5083103A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40519273A | 1973-10-10 | 1973-10-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5083103A true JPS5083103A (ja) | 1975-07-05 |
| JPS5842459B2 JPS5842459B2 (ja) | 1983-09-20 |
Family
ID=23602667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49115691A Expired JPS5842459B2 (ja) | 1973-10-10 | 1974-10-09 | カンコウゾウノケイセイホウ |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5842459B2 (ja) |
| BE (1) | BE820855A (ja) |
| CA (1) | CA1053956A (ja) |
| DE (1) | DE2446098C3 (ja) |
| FR (1) | FR2247752B1 (ja) |
| GB (1) | GB1488709A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110216176A (zh) * | 2019-07-09 | 2019-09-10 | 南京机电职业技术学院 | 一种可调节式可同时生产不同弯度的大口径弯管生产机 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL101499C (ja) * | 1951-08-20 | |||
| NL108006C (ja) * | 1957-05-17 | |||
| US3326710A (en) * | 1964-04-16 | 1967-06-20 | Sherwin Williams Co | Method of curing polyester compositions and coatings containing synergistic combination of photosensitizers and compositions thereof |
| IL31102A (en) * | 1967-12-18 | 1972-05-30 | Fmc Corp | Process of making polymeric relief plate |
| US3556792A (en) * | 1968-05-22 | 1971-01-19 | Gaf Corp | Novel substituted allyl polymer derivatives useful as photoresists |
-
1974
- 1974-09-04 GB GB3860374A patent/GB1488709A/en not_active Expired
- 1974-09-26 DE DE19742446098 patent/DE2446098C3/de not_active Expired
- 1974-10-02 FR FR7433219A patent/FR2247752B1/fr not_active Expired
- 1974-10-09 JP JP49115691A patent/JPS5842459B2/ja not_active Expired
- 1974-10-09 CA CA211,092A patent/CA1053956A/en not_active Expired
- 1974-10-09 BE BE149346A patent/BE820855A/xx not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110216176A (zh) * | 2019-07-09 | 2019-09-10 | 南京机电职业技术学院 | 一种可调节式可同时生产不同弯度的大口径弯管生产机 |
| CN110216176B (zh) * | 2019-07-09 | 2024-05-28 | 南京机电职业技术学院 | 一种可调节式可同时生产不同弯度的大口径弯管生产机 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1488709A (en) | 1977-10-12 |
| BE820855A (fr) | 1975-02-03 |
| DE2446098A1 (de) | 1975-04-17 |
| FR2247752B1 (ja) | 1981-05-29 |
| DE2446098B2 (de) | 1979-08-30 |
| CA1053956A (en) | 1979-05-08 |
| FR2247752A1 (ja) | 1975-05-09 |
| JPS5842459B2 (ja) | 1983-09-20 |
| DE2446098C3 (de) | 1985-05-30 |