FR2247752B1 - - Google Patents

Info

Publication number
FR2247752B1
FR2247752B1 FR7433219A FR7433219A FR2247752B1 FR 2247752 B1 FR2247752 B1 FR 2247752B1 FR 7433219 A FR7433219 A FR 7433219A FR 7433219 A FR7433219 A FR 7433219A FR 2247752 B1 FR2247752 B1 FR 2247752B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7433219A
Other versions
FR2247752A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Publication of FR2247752A1 publication Critical patent/FR2247752A1/fr
Application granted granted Critical
Publication of FR2247752B1 publication Critical patent/FR2247752B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FR7433219A 1973-10-10 1974-10-02 Expired FR2247752B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40519273A 1973-10-10 1973-10-10

Publications (2)

Publication Number Publication Date
FR2247752A1 FR2247752A1 (fr) 1975-05-09
FR2247752B1 true FR2247752B1 (fr) 1981-05-29

Family

ID=23602667

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7433219A Expired FR2247752B1 (fr) 1973-10-10 1974-10-02

Country Status (6)

Country Link
JP (1) JPS5842459B2 (fr)
BE (1) BE820855A (fr)
CA (1) CA1053956A (fr)
DE (1) DE2446098C3 (fr)
FR (1) FR2247752B1 (fr)
GB (1) GB1488709A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110216176B (zh) * 2019-07-09 2024-05-28 南京机电职业技术学院 一种可调节式可同时生产不同弯度的大口径弯管生产机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL101499C (fr) * 1951-08-20
NL227834A (fr) * 1957-05-17
US3326710A (en) * 1964-04-16 1967-06-20 Sherwin Williams Co Method of curing polyester compositions and coatings containing synergistic combination of photosensitizers and compositions thereof
GB1217756A (en) * 1967-12-18 1970-12-31 Fmc Corp Polymeric relief plate
US3556793A (en) * 1968-05-22 1971-01-19 Gaf Corp Novel substituted allyl polymer derivatives useful as photoresists

Also Published As

Publication number Publication date
DE2446098B2 (de) 1979-08-30
GB1488709A (en) 1977-10-12
JPS5083103A (fr) 1975-07-05
FR2247752A1 (fr) 1975-05-09
JPS5842459B2 (ja) 1983-09-20
CA1053956A (fr) 1979-05-08
DE2446098C3 (de) 1985-05-30
BE820855A (fr) 1975-02-03
DE2446098A1 (de) 1975-04-17

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Legal Events

Date Code Title Description
ST Notification of lapse