JPS5078372A - - Google Patents

Info

Publication number
JPS5078372A
JPS5078372A JP49107020A JP10702074A JPS5078372A JP S5078372 A JPS5078372 A JP S5078372A JP 49107020 A JP49107020 A JP 49107020A JP 10702074 A JP10702074 A JP 10702074A JP S5078372 A JPS5078372 A JP S5078372A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49107020A
Other languages
Japanese (ja)
Other versions
JPS5714493B2 (cg-RX-API-DMAC7.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5078372A publication Critical patent/JPS5078372A/ja
Publication of JPS5714493B2 publication Critical patent/JPS5714493B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/23Bi-refringence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP10702074A 1973-09-17 1974-09-17 Expired JPS5714493B2 (cg-RX-API-DMAC7.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US398121A US3902805A (en) 1973-09-17 1973-09-17 Automatic birefringence measuring apparatus

Publications (2)

Publication Number Publication Date
JPS5078372A true JPS5078372A (cg-RX-API-DMAC7.html) 1975-06-26
JPS5714493B2 JPS5714493B2 (cg-RX-API-DMAC7.html) 1982-03-25

Family

ID=23574069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10702074A Expired JPS5714493B2 (cg-RX-API-DMAC7.html) 1973-09-17 1974-09-17

Country Status (4)

Country Link
US (1) US3902805A (cg-RX-API-DMAC7.html)
JP (1) JPS5714493B2 (cg-RX-API-DMAC7.html)
FR (1) FR2244164B1 (cg-RX-API-DMAC7.html)
GB (1) GB1474227A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63174050U (cg-RX-API-DMAC7.html) * 1987-01-16 1988-11-11
JPH02102437A (ja) * 1988-10-08 1990-04-16 Kanzaki Paper Mfg Co Ltd レターデーション等の測定方法
JPH02102436A (ja) * 1988-10-08 1990-04-16 Kanzaki Paper Mfg Co Ltd レターデーション測定方法

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2347666A1 (fr) * 1976-04-09 1977-11-04 France Etat Photoelasticimetre automatique a deux longueurs d'ondes
FR2348482A1 (fr) * 1976-04-14 1977-11-10 Tech Ind Mecaniquesi Fr Centre Procede et dispositif de photoelasticimetrie
FR2365793A1 (fr) * 1976-09-23 1978-04-21 France Etat Ellipsometre a birefringent tournant en son application a la photo-elasticimetrie
FR2381300A1 (fr) * 1977-02-21 1978-09-15 France Etat Photo-elasticimetre dynamique a birefringent tournant
US4320966A (en) * 1979-05-16 1982-03-23 Reytblatt Zinovy V Fourier processor of photoelastic data and method of using same
US4523848A (en) * 1981-10-01 1985-06-18 National Research Development Corporation Polariscope
US4556791A (en) * 1983-06-07 1985-12-03 Sperry Corporation Photoelastic sensor using a variable intensity light source as a feedback means
US4681449A (en) * 1984-09-07 1987-07-21 Stanford University High speed testing of electronic circuits by electro-optic sampling
DE3435059A1 (de) * 1984-09-25 1986-03-27 Hoechst Ag, 6230 Frankfurt Verfahren und vorrichtung zur kontinuierlichen bestimmung der anisotropiezustaende von optisch aktiven materialien
JPS62157549A (ja) * 1985-12-30 1987-07-13 Kanzaki Paper Mfg Co Ltd シート状透光性試料の異方性測定方法
US4789236A (en) * 1986-08-07 1988-12-06 Lockheed Missiles & Space Company, Inc. Stress sensor
GB8706318D0 (en) * 1987-03-17 1987-04-23 Bicc Plc Optical sensor
DD276734A1 (de) * 1988-11-02 1990-03-07 Zeiss Jena Veb Carl Verfahren zur gangunterschiedsmessung an anisotropen transparenten objekten
US5257092A (en) * 1990-06-27 1993-10-26 Asahi Kogaku Kogyo Kabushiki Kaisha Apparatus for measuring polarization and birefringence
DE4306050A1 (en) * 1992-02-29 1993-09-02 Kanzaki Paper Mfg Co Ltd Measuring double refraction to measure foil thickness - by applying phase plate to sample, measuring intensity of light momentarily passing through, etc.
JP2792315B2 (ja) * 1992-03-10 1998-09-03 松下電器産業株式会社 複屈折測定装置
JP2810976B2 (ja) * 1994-11-28 1998-10-15 工業技術院長 電気信号測定方法および装置
DE19511707B4 (de) * 1995-03-30 2007-09-27 Isra Vision Lasor Gmbh Verfahren zur Bestimmung von Spannungen in transparenten Materialien
GB9514487D0 (en) * 1995-07-14 1995-09-13 Univ Sheffield Optical collector head etc
US5723794A (en) * 1995-09-29 1998-03-03 Reliance Electric Industrial Company Photoelastic neural torque sensor
US6055053A (en) * 1997-06-02 2000-04-25 Stress Photonics, Inc. Full field photoelastic stress analysis
CA2297672A1 (en) 1997-07-28 1999-02-04 Hinds Instruments, Inc. Measurement of waveplate retardation using a photoelastic modulator
CA2319729A1 (en) 1998-02-20 1999-08-26 Hinds Instruments, Inc. Birefringence measurement system
US5864403A (en) * 1998-02-23 1999-01-26 National Research Council Of Canada Method and apparatus for measurement of absolute biaxial birefringence in monolayer and multilayer films, sheets and shapes
FR2783918B1 (fr) * 1998-09-24 2000-12-01 Saint Gobain Vitrage Procede et dispositif pour la mesure des contraintes de forme dans un vitrage recouvert sur l'une de ses faces d'une couche opaque
ES2211004T3 (es) * 1998-06-22 2004-07-01 Saint-Gobain Glass France Medicion de las tensiones de forma en un material transparente, tal como un acristalamiento.
US6697157B2 (en) * 1999-05-24 2004-02-24 Hinds Instruments Birefringence measurement
DE19953528B4 (de) * 1999-11-05 2010-10-07 Schott Ag Vorrichtung und Verfahren zur automatischen Messung der Spannungsdoppelbrechung mit feststehendem Analysator
US6268914B1 (en) 2000-01-14 2001-07-31 Hinds Instruments, Inc. Calibration Process For Birefringence Measurement System
US6628388B2 (en) * 2000-11-06 2003-09-30 The Regents Of The University Of California Detection of birefringent microcrystals in bile
US6628387B2 (en) * 2000-11-06 2003-09-30 The Regents Of The University Of California Interrogation cradle and insertable containment fixture for detecting birefringent microcrystals in bile
US6674522B2 (en) * 2001-05-04 2004-01-06 Kla-Tencor Technologies Corporation Efficient phase defect detection system and method
EP1397651B1 (en) * 2001-06-18 2007-06-06 Hinds Instruments, Inc. Birefringence measurement at deep-ultraviolet wavelengths
US7298492B2 (en) * 2004-12-29 2007-11-20 Honeywell International Inc. Method and system for on-line measurement of thickness and birefringence of thin plastic films
NL2009824A (en) * 2011-12-21 2013-06-24 Asml Netherlands Bv Lithographic apparatus with a deformation sensor.
US20140268149A1 (en) * 2013-03-15 2014-09-18 University Of Rochester Device and method for detection of polarization features
JP2016053478A (ja) * 2014-09-02 2016-04-14 株式会社東芝 相分離観測方法、相分離観測装置、及びアニール装置
DE102015201909B4 (de) * 2015-02-04 2016-10-20 Technische Universität München Verfahren und System zum Ermitteln eines optischen Gangunterschieds zwischen in einem doppelbrechenden Objekt entstehenden Teillichtwellen
KR101915843B1 (ko) * 2016-06-29 2018-11-08 한국과학기술원 복굴절 매질을 이용한 영상 깊이 추정 방법 및 장치
US11341620B2 (en) 2020-05-05 2022-05-24 Microsoft Technology Licensing, Llc Background correction for birefringence measurements
US11422086B2 (en) * 2020-05-05 2022-08-23 Microsoft Technology Licensing, Llc Efficient reading of birefringent data

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3520615A (en) * 1965-10-25 1970-07-14 Vickers Ltd Optical phase measuring apparatus
US3373652A (en) * 1967-06-29 1968-03-19 Scott Engineering Sciences Cor Educational polariscope apparatus for determining and observing stress in photoelastic materials
US3649931A (en) * 1969-11-03 1972-03-14 Sperry Rand Corp Compensated frequency biasing system for ring laser

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63174050U (cg-RX-API-DMAC7.html) * 1987-01-16 1988-11-11
JPH02102437A (ja) * 1988-10-08 1990-04-16 Kanzaki Paper Mfg Co Ltd レターデーション等の測定方法
JPH02102436A (ja) * 1988-10-08 1990-04-16 Kanzaki Paper Mfg Co Ltd レターデーション測定方法

Also Published As

Publication number Publication date
US3902805A (en) 1975-09-02
FR2244164A1 (cg-RX-API-DMAC7.html) 1975-04-11
JPS5714493B2 (cg-RX-API-DMAC7.html) 1982-03-25
FR2244164B1 (cg-RX-API-DMAC7.html) 1979-02-16
GB1474227A (en) 1977-05-18

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