JPS5068066A - - Google Patents
Info
- Publication number
- JPS5068066A JPS5068066A JP48115762A JP11576273A JPS5068066A JP S5068066 A JPS5068066 A JP S5068066A JP 48115762 A JP48115762 A JP 48115762A JP 11576273 A JP11576273 A JP 11576273A JP S5068066 A JPS5068066 A JP S5068066A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48115762A JPS5068066A ( ) | 1973-10-17 | 1973-10-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48115762A JPS5068066A ( ) | 1973-10-17 | 1973-10-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5068066A true JPS5068066A ( ) | 1975-06-07 |
Family
ID=14670401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP48115762A Pending JPS5068066A ( ) | 1973-10-17 | 1973-10-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5068066A ( ) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5958826A (ja) * | 1982-09-28 | 1984-04-04 | Fujitsu Ltd | 密着露光方法 |
JPS59149024A (ja) * | 1983-02-16 | 1984-08-25 | Hitachi Ltd | 露光装置 |
JPS61100754A (ja) * | 1984-10-23 | 1986-05-19 | Fujitsu Ltd | 適正露光時間の検出方法 |
JPS61216324A (ja) * | 1985-03-20 | 1986-09-26 | Nec Corp | 縮小投影式露光装置 |
JPS6236532U ( ) * | 1985-08-20 | 1987-03-04 | ||
JPS62183522A (ja) * | 1986-02-07 | 1987-08-11 | Nippon Kogaku Kk <Nikon> | 投影露光方法及び装置 |
JPS62204527A (ja) * | 1986-03-05 | 1987-09-09 | Hitachi Ltd | マスク露光装置 |
JPS6322730U ( ) * | 1986-07-29 | 1988-02-15 | ||
JPH02153517A (ja) * | 1988-12-05 | 1990-06-13 | Mitsubishi Electric Corp | 半導体装置の製造装置 |
-
1973
- 1973-10-17 JP JP48115762A patent/JPS5068066A/ja active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5958826A (ja) * | 1982-09-28 | 1984-04-04 | Fujitsu Ltd | 密着露光方法 |
JPS6253935B2 ( ) * | 1982-09-28 | 1987-11-12 | Fujitsu Ltd | |
JPS59149024A (ja) * | 1983-02-16 | 1984-08-25 | Hitachi Ltd | 露光装置 |
JPH0462167B2 ( ) * | 1983-02-16 | 1992-10-05 | Hitachi Ltd | |
JPS61100754A (ja) * | 1984-10-23 | 1986-05-19 | Fujitsu Ltd | 適正露光時間の検出方法 |
JPS61216324A (ja) * | 1985-03-20 | 1986-09-26 | Nec Corp | 縮小投影式露光装置 |
JPH0548610B2 ( ) * | 1985-03-20 | 1993-07-22 | Nippon Electric Co | |
JPH0416424Y2 ( ) * | 1985-08-20 | 1992-04-13 | ||
JPS6236532U ( ) * | 1985-08-20 | 1987-03-04 | ||
JPS62183522A (ja) * | 1986-02-07 | 1987-08-11 | Nippon Kogaku Kk <Nikon> | 投影露光方法及び装置 |
JPS62204527A (ja) * | 1986-03-05 | 1987-09-09 | Hitachi Ltd | マスク露光装置 |
JPS6322730U ( ) * | 1986-07-29 | 1988-02-15 | ||
JPH02153517A (ja) * | 1988-12-05 | 1990-06-13 | Mitsubishi Electric Corp | 半導体装置の製造装置 |