JPS5067577A - - Google Patents
Info
- Publication number
- JPS5067577A JPS5067577A JP11605473A JP11605473A JPS5067577A JP S5067577 A JPS5067577 A JP S5067577A JP 11605473 A JP11605473 A JP 11605473A JP 11605473 A JP11605473 A JP 11605473A JP S5067577 A JPS5067577 A JP S5067577A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11605473A JPS5536182B2 (en) | 1973-10-15 | 1973-10-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11605473A JPS5536182B2 (en) | 1973-10-15 | 1973-10-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5067577A true JPS5067577A (en) | 1975-06-06 |
| JPS5536182B2 JPS5536182B2 (en) | 1980-09-19 |
Family
ID=14677548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11605473A Expired JPS5536182B2 (en) | 1973-10-15 | 1973-10-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5536182B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56154148U (en) * | 1980-04-17 | 1981-11-18 | ||
| JPS5817443A (en) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | Photoresist developing method and its device |
| JPS5852645A (en) * | 1981-09-24 | 1983-03-28 | Hitachi Ltd | Method and device for development |
| JPS59215729A (en) * | 1983-05-21 | 1984-12-05 | Ulvac Corp | Cleaning method of substrate for semiconductor or magnetic recording medium, etc. and device therefor |
| JPS60117733A (en) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | Developing device for wafer |
| JP2014103274A (en) * | 2012-11-20 | 2014-06-05 | Shindengen Electric Mfg Co Ltd | Resist developing device, resist developing method and method for manufacturing semiconductor device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03105433U (en) * | 1990-02-14 | 1991-10-31 |
-
1973
- 1973-10-15 JP JP11605473A patent/JPS5536182B2/ja not_active Expired
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56154148U (en) * | 1980-04-17 | 1981-11-18 | ||
| JPH0143861Y2 (en) * | 1980-04-17 | 1989-12-19 | ||
| JPS5817443A (en) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | Photoresist developing method and its device |
| JPH0225501B2 (en) * | 1981-07-24 | 1990-06-04 | Hitachi Seisakusho Kk | |
| JPS5852645A (en) * | 1981-09-24 | 1983-03-28 | Hitachi Ltd | Method and device for development |
| JPS59215729A (en) * | 1983-05-21 | 1984-12-05 | Ulvac Corp | Cleaning method of substrate for semiconductor or magnetic recording medium, etc. and device therefor |
| JPH0129054B2 (en) * | 1983-05-21 | 1989-06-07 | Ulvac Corp | |
| JPS60117733A (en) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | Developing device for wafer |
| JP2014103274A (en) * | 2012-11-20 | 2014-06-05 | Shindengen Electric Mfg Co Ltd | Resist developing device, resist developing method and method for manufacturing semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5536182B2 (en) | 1980-09-19 |