JPS505084B1 - - Google Patents
Info
- Publication number
- JPS505084B1 JPS505084B1 JP8050970A JP8050970A JPS505084B1 JP S505084 B1 JPS505084 B1 JP S505084B1 JP 8050970 A JP8050970 A JP 8050970A JP 8050970 A JP8050970 A JP 8050970A JP S505084 B1 JPS505084 B1 JP S505084B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/28—Chemically modified polycondensates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8050970A JPS505084B1 (US08124317-20120228-C00026.png) | 1970-09-16 | 1970-09-16 | |
| DE19712146166 DE2146166A1 (de) | 1970-09-16 | 1971-09-15 | Lichtempfindliche Masse |
| GB4324871A GB1330932A (en) | 1970-09-16 | 1971-09-16 | Phenolic resin condensation product and light-sensitive compositions containing it |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8050970A JPS505084B1 (US08124317-20120228-C00026.png) | 1970-09-16 | 1970-09-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS505084B1 true JPS505084B1 (US08124317-20120228-C00026.png) | 1975-02-28 |
Family
ID=13720268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8050970A Pending JPS505084B1 (US08124317-20120228-C00026.png) | 1970-09-16 | 1970-09-16 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS505084B1 (US08124317-20120228-C00026.png) |
| DE (1) | DE2146166A1 (US08124317-20120228-C00026.png) |
| GB (1) | GB1330932A (US08124317-20120228-C00026.png) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0021716A1 (en) * | 1979-06-16 | 1981-01-07 | Konica Corporation | Condensation product and lithographic printing plates containing said product |
| CN1320014C (zh) * | 2002-10-15 | 2007-06-06 | 爱克发-格法特公司 | 用于热敏石印板前体的聚合物 |
| WO2008114766A1 (ja) * | 2007-03-12 | 2008-09-25 | Tohto Kasei Co., Ltd. | 新規多価ヒドロキシ化合物、該化合物の製造方法、該化合物を用いたエポキシ樹脂並びにエポキシ樹脂組成物及びその硬化物 |
| JP2022033731A (ja) * | 2016-07-21 | 2022-03-02 | 三菱瓦斯化学株式会社 | 化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法 |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS561044A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| US4260673A (en) * | 1979-09-05 | 1981-04-07 | Minnesota Mining And Manufacturing Company | Single sheet color proofing system |
| DE3100077A1 (de) | 1981-01-03 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters |
| DE3127754A1 (de) * | 1981-07-14 | 1983-02-03 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
| EP0155231B2 (de) * | 1984-03-07 | 1997-01-15 | Ciba-Geigy Ag | Verfahren zur Herstellung von Abbildungen |
| US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
| GB8430377D0 (en) * | 1984-12-01 | 1985-01-09 | Ciba Geigy Ag | Modified phenolic resins |
| GB8505402D0 (en) * | 1985-03-02 | 1985-04-03 | Ciba Geigy Ag | Modified phenolic resins |
| DE3629122A1 (de) * | 1986-08-27 | 1988-03-10 | Hoechst Ag | Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch |
| CA2015721A1 (en) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Method of using highly branched novolaks in photoresists |
| DE3935876A1 (de) * | 1989-10-27 | 1991-05-02 | Basf Ag | Strahlungsempfindliches gemisch |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| JP3290316B2 (ja) | 1994-11-18 | 2002-06-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
| JP3506295B2 (ja) | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
| US6511790B2 (en) | 2000-08-25 | 2003-01-28 | Fuji Photo Film Co., Ltd. | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
| DE60137398D1 (de) | 2000-11-30 | 2009-03-05 | Fujifilm Corp | Lithographische Druckplattenvorläufer |
| US20040067435A1 (en) | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
| JP4404734B2 (ja) | 2004-09-27 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4474296B2 (ja) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4404792B2 (ja) | 2005-03-22 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4890403B2 (ja) | 2007-09-27 | 2012-03-07 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
| JP2009085984A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版原版 |
| JP4994175B2 (ja) | 2007-09-28 | 2012-08-08 | 富士フイルム株式会社 | 平版印刷版原版、及びそれに用いる共重合体の製造方法 |
| JP4790682B2 (ja) | 2007-09-28 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版原版 |
| EP2218519A4 (en) | 2007-11-14 | 2012-03-21 | Fujifilm Corp | METHOD FOR DRYING A COATING FILM AND METHOD FOR PRODUCING A PRECURSOR FOR A LITHOGRAPHIC PRINTING PLATE |
| JP2009236355A (ja) | 2008-03-26 | 2009-10-15 | Fujifilm Corp | 乾燥方法及び装置 |
| JP5164640B2 (ja) | 2008-04-02 | 2013-03-21 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP5183380B2 (ja) | 2008-09-09 | 2013-04-17 | 富士フイルム株式会社 | 赤外線レーザ用感光性平版印刷版原版 |
| JP2010237435A (ja) | 2009-03-31 | 2010-10-21 | Fujifilm Corp | 平版印刷版原版 |
| US8883401B2 (en) | 2009-09-24 | 2014-11-11 | Fujifilm Corporation | Lithographic printing original plate |
| JP5490168B2 (ja) | 2012-03-23 | 2014-05-14 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
| JP5512730B2 (ja) | 2012-03-30 | 2014-06-04 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
-
1970
- 1970-09-16 JP JP8050970A patent/JPS505084B1/ja active Pending
-
1971
- 1971-09-15 DE DE19712146166 patent/DE2146166A1/de active Pending
- 1971-09-16 GB GB4324871A patent/GB1330932A/en not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0021716A1 (en) * | 1979-06-16 | 1981-01-07 | Konica Corporation | Condensation product and lithographic printing plates containing said product |
| CN1320014C (zh) * | 2002-10-15 | 2007-06-06 | 爱克发-格法特公司 | 用于热敏石印板前体的聚合物 |
| WO2008114766A1 (ja) * | 2007-03-12 | 2008-09-25 | Tohto Kasei Co., Ltd. | 新規多価ヒドロキシ化合物、該化合物の製造方法、該化合物を用いたエポキシ樹脂並びにエポキシ樹脂組成物及びその硬化物 |
| JP2022033731A (ja) * | 2016-07-21 | 2022-03-02 | 三菱瓦斯化学株式会社 | 化合物、樹脂、組成物並びにレジストパターン形成方法及び回路パターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2146166A1 (de) | 1972-03-23 |
| GB1330932A (en) | 1973-09-19 |
