JPS5045742A - - Google Patents
Info
- Publication number
- JPS5045742A JPS5045742A JP49057224A JP5722474A JPS5045742A JP S5045742 A JPS5045742 A JP S5045742A JP 49057224 A JP49057224 A JP 49057224A JP 5722474 A JP5722474 A JP 5722474A JP S5045742 A JPS5045742 A JP S5045742A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
-
- H10P50/667—
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39163573A | 1973-08-27 | 1973-08-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5045742A true JPS5045742A (ja) | 1975-04-24 |
Family
ID=23547361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49057224A Pending JPS5045742A (ja) | 1973-08-27 | 1974-05-21 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5045742A (ja) |
| DE (1) | DE2425379A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102678604A (zh) * | 2012-04-19 | 2012-09-19 | 台达电子企业管理(上海)有限公司 | 一种散热风扇及其底座的金属蚀刻方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2049210B (en) * | 1979-02-26 | 1983-09-01 | Shipley Co | Photographic formation of visible images |
| EP0082210B1 (de) * | 1981-12-18 | 1985-04-10 | Mta Müszaki Fizikai Kutato Intezete | Verfahren zum selektiven Lösen von Molybdän in Gegenwart von Wolfram |
| DE19535307C2 (de) * | 1995-09-22 | 1997-10-23 | Siemens Ag | Ätzlösung zur Erzeugung sehr feiner Strukturen in Molybdän-Oberflächen und Verfahren unter deren Einsatz |
| KR100364831B1 (ko) * | 2000-03-20 | 2002-12-16 | 엘지.필립스 엘시디 주식회사 | 몰리브덴 금속막용 에칭 용액 |
-
1974
- 1974-05-21 JP JP49057224A patent/JPS5045742A/ja active Pending
- 1974-05-25 DE DE19742425379 patent/DE2425379A1/de active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102678604A (zh) * | 2012-04-19 | 2012-09-19 | 台达电子企业管理(上海)有限公司 | 一种散热风扇及其底座的金属蚀刻方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2425379A1 (de) | 1975-03-27 |