JPS5042698U - - Google Patents
Info
- Publication number
- JPS5042698U JPS5042698U JP9656473U JP9656473U JPS5042698U JP S5042698 U JPS5042698 U JP S5042698U JP 9656473 U JP9656473 U JP 9656473U JP 9656473 U JP9656473 U JP 9656473U JP S5042698 U JPS5042698 U JP S5042698U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9656473U JPS547115Y2 (enrdf_load_stackoverflow) | 1973-08-17 | 1973-08-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9656473U JPS547115Y2 (enrdf_load_stackoverflow) | 1973-08-17 | 1973-08-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5042698U true JPS5042698U (enrdf_load_stackoverflow) | 1975-04-30 |
JPS547115Y2 JPS547115Y2 (enrdf_load_stackoverflow) | 1979-04-03 |
Family
ID=28294630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9656473U Expired JPS547115Y2 (enrdf_load_stackoverflow) | 1973-08-17 | 1973-08-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS547115Y2 (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5457866A (en) * | 1977-10-18 | 1979-05-10 | Toshiba Corp | Surface-processing method for semiconductor substrate |
JPS5694040U (enrdf_load_stackoverflow) * | 1979-12-19 | 1981-07-25 | ||
JPS57159029A (en) * | 1981-03-25 | 1982-10-01 | Seiichiro Sogo | Oxidized film etching device for semiconductor wafer |
JPS585342U (ja) * | 1981-06-30 | 1983-01-13 | 富士通株式会社 | ウェハ−表面処理装置 |
JPS5849437U (ja) * | 1981-09-29 | 1983-04-04 | 富士通株式会社 | 基板表面処理装置 |
JPS6086837A (ja) * | 1983-10-19 | 1985-05-16 | Matsushita Electronics Corp | 半導体装置の製造方法 |
-
1973
- 1973-08-17 JP JP9656473U patent/JPS547115Y2/ja not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5457866A (en) * | 1977-10-18 | 1979-05-10 | Toshiba Corp | Surface-processing method for semiconductor substrate |
JPS5694040U (enrdf_load_stackoverflow) * | 1979-12-19 | 1981-07-25 | ||
JPS57159029A (en) * | 1981-03-25 | 1982-10-01 | Seiichiro Sogo | Oxidized film etching device for semiconductor wafer |
JPS585342U (ja) * | 1981-06-30 | 1983-01-13 | 富士通株式会社 | ウェハ−表面処理装置 |
JPS5849437U (ja) * | 1981-09-29 | 1983-04-04 | 富士通株式会社 | 基板表面処理装置 |
JPS6086837A (ja) * | 1983-10-19 | 1985-05-16 | Matsushita Electronics Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS547115Y2 (enrdf_load_stackoverflow) | 1979-04-03 |