JPS5040116A - - Google Patents
Info
- Publication number
- JPS5040116A JPS5040116A JP9182973A JP9182973A JPS5040116A JP S5040116 A JPS5040116 A JP S5040116A JP 9182973 A JP9182973 A JP 9182973A JP 9182973 A JP9182973 A JP 9182973A JP S5040116 A JPS5040116 A JP S5040116A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Magnetic Heads (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9182973A JPS5333053B2 (et) | 1973-08-15 | 1973-08-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9182973A JPS5333053B2 (et) | 1973-08-15 | 1973-08-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5040116A true JPS5040116A (et) | 1975-04-12 |
| JPS5333053B2 JPS5333053B2 (et) | 1978-09-12 |
Family
ID=14037481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9182973A Expired JPS5333053B2 (et) | 1973-08-15 | 1973-08-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5333053B2 (et) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4145458A (en) * | 1976-09-24 | 1979-03-20 | U.S. Philips Corporation | Method of producing internally coated glass tubes for the drawing of fiber-optic light conductors |
| US4173661A (en) * | 1976-11-18 | 1979-11-06 | Alsthom-Atlantique | Method for depositing thin layers of materials by decomposing a gas to yield a plasma |
| JPS56275A (en) * | 1979-06-12 | 1981-01-06 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Metal film formation |
| US4363868A (en) * | 1979-12-26 | 1982-12-14 | Fujitsu Limited | Process of producing semiconductor devices by forming a silicon oxynitride layer by a plasma CVD technique which is employed in a selective oxidation process |
| JPS6184836A (ja) * | 1984-10-02 | 1986-04-30 | Dainippon Screen Mfg Co Ltd | 薄膜形成方法 |
-
1973
- 1973-08-15 JP JP9182973A patent/JPS5333053B2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4145458A (en) * | 1976-09-24 | 1979-03-20 | U.S. Philips Corporation | Method of producing internally coated glass tubes for the drawing of fiber-optic light conductors |
| US4173661A (en) * | 1976-11-18 | 1979-11-06 | Alsthom-Atlantique | Method for depositing thin layers of materials by decomposing a gas to yield a plasma |
| JPS56275A (en) * | 1979-06-12 | 1981-01-06 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Metal film formation |
| JPS6135270B2 (et) * | 1979-06-12 | 1986-08-12 | Cho Eru Esu Ai Gijutsu Kenkyu Kumiai | |
| US4363868A (en) * | 1979-12-26 | 1982-12-14 | Fujitsu Limited | Process of producing semiconductor devices by forming a silicon oxynitride layer by a plasma CVD technique which is employed in a selective oxidation process |
| JPS6184836A (ja) * | 1984-10-02 | 1986-04-30 | Dainippon Screen Mfg Co Ltd | 薄膜形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5333053B2 (et) | 1978-09-12 |