JPS5038471A - - Google Patents
Info
- Publication number
- JPS5038471A JPS5038471A JP8842673A JP8842673A JPS5038471A JP S5038471 A JPS5038471 A JP S5038471A JP 8842673 A JP8842673 A JP 8842673A JP 8842673 A JP8842673 A JP 8842673A JP S5038471 A JPS5038471 A JP S5038471A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Specific Conveyance Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8842673A JPS5038471A (ja) | 1973-08-08 | 1973-08-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8842673A JPS5038471A (ja) | 1973-08-08 | 1973-08-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5038471A true JPS5038471A (ja) | 1975-04-09 |
Family
ID=13942443
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8842673A Pending JPS5038471A (ja) | 1973-08-08 | 1973-08-08 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5038471A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4933577A (ja) * | 1972-07-26 | 1974-03-28 | ||
JPS5599737A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Work-posture adjusting device |
JPS5687320A (en) * | 1979-12-17 | 1981-07-15 | M Setetsuku Kk | Photoresist coating device on both sides |
JPS63308337A (ja) * | 1987-06-10 | 1988-12-15 | Teru Kyushu Kk | スピンナ− |
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1973
- 1973-08-08 JP JP8842673A patent/JPS5038471A/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4933577A (ja) * | 1972-07-26 | 1974-03-28 | ||
JPS5132538B2 (ja) * | 1972-07-26 | 1976-09-13 | ||
JPS5599737A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Work-posture adjusting device |
JPS5687320A (en) * | 1979-12-17 | 1981-07-15 | M Setetsuku Kk | Photoresist coating device on both sides |
JPS5833697B2 (ja) * | 1979-12-17 | 1983-07-21 | ヱム・セテツク株式会社 | フオトレジストの両面塗布装置 |
JPS63308337A (ja) * | 1987-06-10 | 1988-12-15 | Teru Kyushu Kk | スピンナ− |