JPS5599737A - Work-posture adjusting device - Google Patents

Work-posture adjusting device

Info

Publication number
JPS5599737A
JPS5599737A JP712879A JP712879A JPS5599737A JP S5599737 A JPS5599737 A JP S5599737A JP 712879 A JP712879 A JP 712879A JP 712879 A JP712879 A JP 712879A JP S5599737 A JPS5599737 A JP S5599737A
Authority
JP
Japan
Prior art keywords
wafer
stopper
station
works
work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP712879A
Other languages
Japanese (ja)
Inventor
Tetsuya Takagaki
Hiroto Nagatomo
Hisao Seki
Shiro Terasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP712879A priority Critical patent/JPS5599737A/en
Publication of JPS5599737A publication Critical patent/JPS5599737A/en
Pending legal-status Critical Current

Links

Landscapes

  • Attitude Control For Articles On Conveyors (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To prevent breakdown and contamination caused by mishandling of works by automatic adjusting of supplying posture of works and by automatic supply thereof.
CONSTITUTION: Front and rear surface adjusting mechanism 11 performs to level guide groove 23 horizontally at wafer station A and bring close pin 25 of No.1 stopper 27 and keeps entering wafer 24 not to drop out from container 15. At the time of moving to station B, No.2 stopper 28 is closed and No.1 stopper opened and rotate to left around rotary shaft 22 and make wafer 24 stand straight. Then, wafer 24 is rotated and by this, t surface is positioned downward. When the wafer is moved to wafer supply station D, wafer 24 is dropped into heat treatment jig located underneath.
COPYRIGHT: (C)1980,JPO&Japio
JP712879A 1979-01-26 1979-01-26 Work-posture adjusting device Pending JPS5599737A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP712879A JPS5599737A (en) 1979-01-26 1979-01-26 Work-posture adjusting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP712879A JPS5599737A (en) 1979-01-26 1979-01-26 Work-posture adjusting device

Publications (1)

Publication Number Publication Date
JPS5599737A true JPS5599737A (en) 1980-07-30

Family

ID=11657432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP712879A Pending JPS5599737A (en) 1979-01-26 1979-01-26 Work-posture adjusting device

Country Status (1)

Country Link
JP (1) JPS5599737A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9358747B2 (en) 2007-12-14 2016-06-07 Avure Technologies Ab Hot isostatic pressing arrangement

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5038471A (en) * 1973-08-08 1975-04-09
JPS5081070A (en) * 1973-11-15 1975-07-01
JPS512524U (en) * 1974-06-24 1976-01-09

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5038471A (en) * 1973-08-08 1975-04-09
JPS5081070A (en) * 1973-11-15 1975-07-01
JPS512524U (en) * 1974-06-24 1976-01-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9358747B2 (en) 2007-12-14 2016-06-07 Avure Technologies Ab Hot isostatic pressing arrangement

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