JPS5036203A - - Google Patents

Info

Publication number
JPS5036203A
JPS5036203A JP8533273A JP8533273A JPS5036203A JP S5036203 A JPS5036203 A JP S5036203A JP 8533273 A JP8533273 A JP 8533273A JP 8533273 A JP8533273 A JP 8533273A JP S5036203 A JPS5036203 A JP S5036203A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8533273A
Other languages
Japanese (ja)
Other versions
JPS5619619B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8533273A priority Critical patent/JPS5619619B2/ja
Priority to GB3323774A priority patent/GB1442934A/en
Publication of JPS5036203A publication Critical patent/JPS5036203A/ja
Priority to US05/689,874 priority patent/US4105450A/en
Publication of JPS5619619B2 publication Critical patent/JPS5619619B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP8533273A 1973-07-27 1973-07-27 Expired JPS5619619B2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (de) 1973-07-27 1973-07-27
GB3323774A GB1442934A (en) 1973-07-27 1974-07-26 Light-sensitive naphtho-quinone diazide composition
US05/689,874 US4105450A (en) 1973-07-27 1976-05-25 Spectrally sensitized positive light-sensitive o-quinone diazide containing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (de) 1973-07-27 1973-07-27

Publications (2)

Publication Number Publication Date
JPS5036203A true JPS5036203A (de) 1975-04-05
JPS5619619B2 JPS5619619B2 (de) 1981-05-08

Family

ID=13855667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8533273A Expired JPS5619619B2 (de) 1973-07-27 1973-07-27

Country Status (2)

Country Link
JP (1) JPS5619619B2 (de)
GB (1) GB1442934A (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
EP0737895A1 (de) * 1995-04-10 1996-10-16 Shipley Company LLC Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
JPH0588466B2 (de) * 1985-03-27 1993-12-22 Japan Synthetic Rubber Co Ltd
EP0737895A1 (de) * 1995-04-10 1996-10-16 Shipley Company LLC Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
US5723254A (en) * 1995-04-10 1998-03-03 Shipley Company, L.L.C. Photoresist with photoactive compound mixtures
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法

Also Published As

Publication number Publication date
GB1442934A (en) 1976-07-14
JPS5619619B2 (de) 1981-05-08

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