JPS5034442B2 - - Google Patents

Info

Publication number
JPS5034442B2
JPS5034442B2 JP12298973A JP12298973A JPS5034442B2 JP S5034442 B2 JPS5034442 B2 JP S5034442B2 JP 12298973 A JP12298973 A JP 12298973A JP 12298973 A JP12298973 A JP 12298973A JP S5034442 B2 JPS5034442 B2 JP S5034442B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12298973A
Other languages
Japanese (ja)
Other versions
JPS4994402A (US07652168-20100126-C00068.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/302,994 external-priority patent/US4147545A/en
Priority claimed from US303071A external-priority patent/US3891439A/en
Priority claimed from US303072A external-priority patent/US3891438A/en
Application filed filed Critical
Publication of JPS4994402A publication Critical patent/JPS4994402A/ja
Publication of JPS5034442B2 publication Critical patent/JPS5034442B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12298973A 1972-11-02 1973-11-02 Expired JPS5034442B2 (US07652168-20100126-C00068.png)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US05/302,994 US4147545A (en) 1972-11-02 1972-11-02 Photolithographic developing composition with organic lithium compound
US303071A US3891439A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates
US303072A US3891438A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates

Publications (2)

Publication Number Publication Date
JPS4994402A JPS4994402A (US07652168-20100126-C00068.png) 1974-09-07
JPS5034442B2 true JPS5034442B2 (US07652168-20100126-C00068.png) 1975-11-08

Family

ID=27404911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12298973A Expired JPS5034442B2 (US07652168-20100126-C00068.png) 1972-11-02 1973-11-02

Country Status (6)

Country Link
JP (1) JPS5034442B2 (US07652168-20100126-C00068.png)
AU (1) AU462966B2 (US07652168-20100126-C00068.png)
DE (1) DE2353992C2 (US07652168-20100126-C00068.png)
FR (1) FR2205684A1 (US07652168-20100126-C00068.png)
IT (1) IT997722B (US07652168-20100126-C00068.png)
NL (1) NL173564C (US07652168-20100126-C00068.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146205A (en) * 1974-10-17 1976-04-20 Unitika Ltd Kankosono genzohoho
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
JPH0820738B2 (ja) * 1986-11-21 1996-03-04 オーシージー マイクロエレクトロニック マテリアルズ インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液
JPS63170646A (ja) * 1987-01-08 1988-07-14 Konica Corp 現像性等が改良される感光性平版印刷版から印刷版の作製方法
JPS63271256A (ja) * 1987-04-28 1988-11-09 Konica Corp 感光材料の現像液組成物
JP2591643B2 (ja) * 1988-03-03 1997-03-19 コニカ株式会社 0−キノンジアジド化合物を含有する感光材料の現像液

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE606642A (US07652168-20100126-C00068.png) * 1960-07-29
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof

Also Published As

Publication number Publication date
FR2205684A1 (en) 1974-05-31
NL173564C (nl) 1984-02-01
DE2353992C2 (de) 1982-12-02
JPS4994402A (US07652168-20100126-C00068.png) 1974-09-07
NL7315060A (US07652168-20100126-C00068.png) 1974-05-06
DE2353992A1 (de) 1974-05-16
AU462966B2 (en) 1975-07-10
NL173564B (nl) 1983-09-01
IT997722B (it) 1975-12-30
AU6203273A (en) 1975-05-01
FR2205684B1 (US07652168-20100126-C00068.png) 1976-06-18

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