JPS5032924A - - Google Patents
Info
- Publication number
- JPS5032924A JPS5032924A JP8284973A JP8284973A JPS5032924A JP S5032924 A JPS5032924 A JP S5032924A JP 8284973 A JP8284973 A JP 8284973A JP 8284973 A JP8284973 A JP 8284973A JP S5032924 A JPS5032924 A JP S5032924A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Graft Or Block Polymers (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8284973A JPS5140452B2 (US07655746-20100202-C00011.png) | 1973-07-23 | 1973-07-23 | |
| DE2435390A DE2435390A1 (de) | 1973-07-23 | 1974-07-23 | Verfahren zur herstellung von uvabschirmenden photomasken |
| FR7425452A FR2238953B1 (US07655746-20100202-C00011.png) | 1973-07-23 | 1974-07-23 | |
| GB3258174A GB1475599A (en) | 1973-07-23 | 1974-07-23 | Process for producing ultraviolet-shielding photomasks |
| IT52241/74A IT1016966B (it) | 1973-07-23 | 1974-07-23 | Procedimento per produrre maschere fotografiche schermanti ultra violetto |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8284973A JPS5140452B2 (US07655746-20100202-C00011.png) | 1973-07-23 | 1973-07-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5032924A true JPS5032924A (US07655746-20100202-C00011.png) | 1975-03-29 |
| JPS5140452B2 JPS5140452B2 (US07655746-20100202-C00011.png) | 1976-11-04 |
Family
ID=13785815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8284973A Expired JPS5140452B2 (US07655746-20100202-C00011.png) | 1973-07-23 | 1973-07-23 |
Country Status (5)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5294632A (en) * | 1976-02-04 | 1977-08-09 | Mitsui Constr | Transfer method in compressed air of material lock and its device |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4197133A (en) * | 1977-10-14 | 1980-04-08 | Ciba-Geigy Corporation | Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives |
| IT1138814B (it) * | 1980-07-03 | 1986-09-17 | Rca Corp | Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo |
| US4556625A (en) * | 1982-07-09 | 1985-12-03 | Armstrong World Industries, Inc. | Development of a colored image on a cellulosic material with monosulfonyl azides |
| JPS61166542A (ja) * | 1985-01-18 | 1986-07-28 | Hitachi Chem Co Ltd | 感光性組成物 |
| CA2787249C (en) | 2009-01-29 | 2017-09-12 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1179361A (en) * | 1966-03-12 | 1970-01-28 | Kalle Ag | Reprographic Copying Compositions and Reprographic Copying Materials Prepared therewith |
| US3499759A (en) * | 1967-07-06 | 1970-03-10 | Kalle Ag | Light-sensitive reproduction layer comprising an oxetane polymer |
| US3595656A (en) * | 1967-07-07 | 1971-07-27 | Kalle Ag | Reprographic materials containing a water-insoluble azidochalcone |
-
1973
- 1973-07-23 JP JP8284973A patent/JPS5140452B2/ja not_active Expired
-
1974
- 1974-07-23 IT IT52241/74A patent/IT1016966B/it active
- 1974-07-23 GB GB3258174A patent/GB1475599A/en not_active Expired
- 1974-07-23 DE DE2435390A patent/DE2435390A1/de not_active Withdrawn
- 1974-07-23 FR FR7425452A patent/FR2238953B1/fr not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1179361A (en) * | 1966-03-12 | 1970-01-28 | Kalle Ag | Reprographic Copying Compositions and Reprographic Copying Materials Prepared therewith |
| US3499759A (en) * | 1967-07-06 | 1970-03-10 | Kalle Ag | Light-sensitive reproduction layer comprising an oxetane polymer |
| US3595656A (en) * | 1967-07-07 | 1971-07-27 | Kalle Ag | Reprographic materials containing a water-insoluble azidochalcone |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5294632A (en) * | 1976-02-04 | 1977-08-09 | Mitsui Constr | Transfer method in compressed air of material lock and its device |
| JPS5617518B2 (US07655746-20100202-C00011.png) * | 1976-02-04 | 1981-04-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| IT1016966B (it) | 1977-06-20 |
| FR2238953B1 (US07655746-20100202-C00011.png) | 1977-10-21 |
| DE2435390A1 (de) | 1975-02-13 |
| JPS5140452B2 (US07655746-20100202-C00011.png) | 1976-11-04 |
| FR2238953A1 (US07655746-20100202-C00011.png) | 1975-02-21 |
| GB1475599A (en) | 1977-06-01 |
