JPS5027402B2 - - Google Patents

Info

Publication number
JPS5027402B2
JPS5027402B2 JP2546072A JP2546072A JPS5027402B2 JP S5027402 B2 JPS5027402 B2 JP S5027402B2 JP 2546072 A JP2546072 A JP 2546072A JP 2546072 A JP2546072 A JP 2546072A JP S5027402 B2 JPS5027402 B2 JP S5027402B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2546072A
Other languages
Japanese (ja)
Other versions
JPS4893401A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2546072A priority Critical patent/JPS5027402B2/ja
Priority to IT4872673A priority patent/IT982883B/it
Priority to CH360773A priority patent/CH563026A5/xx
Priority to GB1207773A priority patent/GB1424817A/en
Priority to FR7308853A priority patent/FR2175955B1/fr
Priority to DE2312496A priority patent/DE2312496C2/de
Publication of JPS4893401A publication Critical patent/JPS4893401A/ja
Publication of JPS5027402B2 publication Critical patent/JPS5027402B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2546072A 1972-03-13 1972-03-13 Expired JPS5027402B2 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2546072A JPS5027402B2 (fr) 1972-03-13 1972-03-13
IT4872673A IT982883B (it) 1972-03-13 1973-03-12 Elemento fotosensibile e procedi mento per fabbricare negative a finestra aperta
CH360773A CH563026A5 (fr) 1972-03-13 1973-03-13
GB1207773A GB1424817A (en) 1972-03-13 1973-03-13 Photosensitive elements
FR7308853A FR2175955B1 (fr) 1972-03-13 1973-03-13
DE2312496A DE2312496C2 (de) 1972-03-13 1973-03-13 Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2546072A JPS5027402B2 (fr) 1972-03-13 1972-03-13

Publications (2)

Publication Number Publication Date
JPS4893401A JPS4893401A (fr) 1973-12-03
JPS5027402B2 true JPS5027402B2 (fr) 1975-09-08

Family

ID=12166628

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2546072A Expired JPS5027402B2 (fr) 1972-03-13 1972-03-13

Country Status (2)

Country Link
JP (1) JPS5027402B2 (fr)
DE (1) DE2312496C2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5351004A (en) * 1976-10-18 1978-05-10 Aicello Chemical Co Composition of photosensitive resin plate
JPS5534205A (en) * 1978-08-30 1980-03-10 Hitachi Ltd Photosensitive composition
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE686123C (de) * 1935-06-05 1940-01-03 Chemische Forschungs Gmbh Verfahren zur Veraenderung der Eigenschaften von Polyvinylalkoholen und ihren Derivaten
DE754015C (de) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Lichtempfindliche Schicht zur Herstellung von Druckformen
GB1165832A (en) * 1967-05-12 1969-10-01 Ilford Ltd Photographic Silver Halide Emulsions of the Print-Out Type

Also Published As

Publication number Publication date
DE2312496A1 (de) 1973-09-27
DE2312496C2 (de) 1985-01-31
JPS4893401A (fr) 1973-12-03

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