JPS5025500A - - Google Patents
Info
- Publication number
- JPS5025500A JPS5025500A JP49030139A JP3013974A JPS5025500A JP S5025500 A JPS5025500 A JP S5025500A JP 49030139 A JP49030139 A JP 49030139A JP 3013974 A JP3013974 A JP 3013974A JP S5025500 A JPS5025500 A JP S5025500A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
- H10P14/6306—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
- H10P14/6312—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group III-V semiconductors
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/32—Anodisation of semiconducting materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6324—Formation by anodic treatments, e.g. anodic oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Weting (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34246273A | 1973-03-19 | 1973-03-19 | |
| US00440395A US3844904A (en) | 1973-03-19 | 1974-02-07 | Anodic oxidation of gallium phosphide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5025500A true JPS5025500A (https=) | 1975-03-18 |
Family
ID=26993023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49030139A Pending JPS5025500A (https=) | 1973-03-19 | 1974-03-18 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3844904A (https=) |
| JP (1) | JPS5025500A (https=) |
| DE (1) | DE2412965A1 (https=) |
| FR (1) | FR2222136B1 (https=) |
| GB (1) | GB1431231A (https=) |
| IT (1) | IT1009327B (https=) |
| NL (1) | NL7403596A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1054397C (zh) * | 1993-05-05 | 2000-07-12 | 李毅 | 生产无磷铝盐和碱的洗洁用物质方法 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3929589A (en) * | 1974-02-08 | 1975-12-30 | Bell Telephone Labor Inc | Selective area oxidation of III-V compound semiconductors |
| JPS53105177A (en) * | 1977-02-24 | 1978-09-13 | Toshiba Corp | Manufacture of semiconductor device |
| JPH0220077A (ja) * | 1988-07-08 | 1990-01-23 | Toshiba Corp | 緑色発光ダイオードの製造方法 |
| JPH088256B2 (ja) * | 1990-06-06 | 1996-01-29 | 松下電器産業株式会社 | 化合物半導体のパッシベーション膜の製造方法 |
| CN117431599A (zh) * | 2022-07-14 | 2024-01-23 | 中国科学院理化技术研究所 | 一种在液态金属表面制备微纳结构的方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL280871A (https=) * | 1961-08-19 | |||
| BE792614A (fr) * | 1971-12-13 | 1973-03-30 | Western Electric Co | Procede de realisation d'une couche d'oxyde sur un semi-conducteur |
-
1974
- 1974-02-07 US US00440395A patent/US3844904A/en not_active Expired - Lifetime
- 1974-03-18 FR FR7409063A patent/FR2222136B1/fr not_active Expired
- 1974-03-18 JP JP49030139A patent/JPS5025500A/ja active Pending
- 1974-03-18 DE DE2412965A patent/DE2412965A1/de active Pending
- 1974-03-18 NL NL7403596A patent/NL7403596A/xx not_active Application Discontinuation
- 1974-03-18 IT IT67832/74A patent/IT1009327B/it active
- 1974-03-19 GB GB1212374A patent/GB1431231A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1054397C (zh) * | 1993-05-05 | 2000-07-12 | 李毅 | 生产无磷铝盐和碱的洗洁用物质方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| IT1009327B (it) | 1976-12-10 |
| GB1431231A (en) | 1976-04-07 |
| DE2412965A1 (de) | 1974-09-26 |
| FR2222136A1 (https=) | 1974-10-18 |
| FR2222136B1 (https=) | 1978-02-10 |
| US3844904A (en) | 1974-10-29 |
| NL7403596A (https=) | 1974-09-23 |