JPS5019496A - - Google Patents
Info
- Publication number
- JPS5019496A JPS5019496A JP48070298A JP7029873A JPS5019496A JP S5019496 A JPS5019496 A JP S5019496A JP 48070298 A JP48070298 A JP 48070298A JP 7029873 A JP7029873 A JP 7029873A JP S5019496 A JPS5019496 A JP S5019496A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7029873A JPS5412079B2 (enrdf_load_stackoverflow) | 1973-06-20 | 1973-06-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7029873A JPS5412079B2 (enrdf_load_stackoverflow) | 1973-06-20 | 1973-06-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5019496A true JPS5019496A (enrdf_load_stackoverflow) | 1975-02-28 |
| JPS5412079B2 JPS5412079B2 (enrdf_load_stackoverflow) | 1979-05-19 |
Family
ID=13427399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7029873A Expired JPS5412079B2 (enrdf_load_stackoverflow) | 1973-06-20 | 1973-06-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5412079B2 (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS544828A (en) * | 1977-06-14 | 1979-01-13 | Nippon Electro Plating | Method of adjusting plating thickness in automatic continuous plating and measuring device therefor |
| US6019886A (en) * | 1996-09-17 | 2000-02-01 | Texas Instruments Incorporated | Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process |
| CN112958116A (zh) * | 2021-02-22 | 2021-06-15 | 西南大学 | 一种Bi2O2.33-CdS复合光催化剂及其制备工艺 |
-
1973
- 1973-06-20 JP JP7029873A patent/JPS5412079B2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS544828A (en) * | 1977-06-14 | 1979-01-13 | Nippon Electro Plating | Method of adjusting plating thickness in automatic continuous plating and measuring device therefor |
| US6019886A (en) * | 1996-09-17 | 2000-02-01 | Texas Instruments Incorporated | Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process |
| CN112958116A (zh) * | 2021-02-22 | 2021-06-15 | 西南大学 | 一种Bi2O2.33-CdS复合光催化剂及其制备工艺 |
| CN112958116B (zh) * | 2021-02-22 | 2021-11-19 | 西南大学 | 一种Bi2O2.33-CdS复合光催化剂及其制备工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5412079B2 (enrdf_load_stackoverflow) | 1979-05-19 |