JPS5017973A - - Google Patents

Info

Publication number
JPS5017973A
JPS5017973A JP48068439A JP6843973A JPS5017973A JP S5017973 A JPS5017973 A JP S5017973A JP 48068439 A JP48068439 A JP 48068439A JP 6843973 A JP6843973 A JP 6843973A JP S5017973 A JPS5017973 A JP S5017973A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48068439A
Other versions
JPS5636566B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6843973A priority Critical patent/JPS5636566B2/ja
Priority to US05/478,892 priority patent/US3950094A/en
Priority to DE2428926A priority patent/DE2428926C2/de
Priority to FR7420949A priority patent/FR2233650B1/fr
Priority to GB2713374A priority patent/GB1462388A/en
Publication of JPS5017973A publication Critical patent/JPS5017973A/ja
Publication of JPS5636566B2 publication Critical patent/JPS5636566B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
JP6843973A 1973-06-18 1973-06-18 Expired JPS5636566B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP6843973A JPS5636566B2 (ja) 1973-06-18 1973-06-18
US05/478,892 US3950094A (en) 1973-06-18 1974-06-12 Both-side printing device
DE2428926A DE2428926C2 (de) 1973-06-18 1974-06-15 Vorrichtung zum beidseitigem Kopieren von Schaltungsmustern auf ein Halbleiterplättchen
FR7420949A FR2233650B1 (ja) 1973-06-18 1974-06-17
GB2713374A GB1462388A (en) 1973-06-18 1974-06-18 Apparatus for printing on two surfaces of a radiation-sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6843973A JPS5636566B2 (ja) 1973-06-18 1973-06-18

Publications (2)

Publication Number Publication Date
JPS5017973A true JPS5017973A (ja) 1975-02-25
JPS5636566B2 JPS5636566B2 (ja) 1981-08-25

Family

ID=13373726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6843973A Expired JPS5636566B2 (ja) 1973-06-18 1973-06-18

Country Status (5)

Country Link
US (1) US3950094A (ja)
JP (1) JPS5636566B2 (ja)
DE (1) DE2428926C2 (ja)
FR (1) FR2233650B1 (ja)
GB (1) GB1462388A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015011019A (ja) * 2013-07-02 2015-01-19 株式会社東芝 直流電圧測定装置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4080065A (en) * 1975-10-06 1978-03-21 Spence Bate Microfiche camera editing device
SE7611561L (sv) * 1975-10-20 1977-04-21 Izon Upptecknings- och betraktningsapparat for filmband
JP2994232B2 (ja) * 1995-07-28 1999-12-27 ウシオ電機株式会社 マスクとマスクまたはマスクとワークの位置合わせ方法および装置
JP3201233B2 (ja) * 1995-10-20 2001-08-20 ウシオ電機株式会社 裏面にアライメント・マークが設けられたワークの投影露光方法
JP3445100B2 (ja) * 1997-06-02 2003-09-08 キヤノン株式会社 位置検出方法及び位置検出装置
US8632590B2 (en) 1999-10-20 2014-01-21 Anulex Technologies, Inc. Apparatus and methods for the treatment of the intervertebral disc
US7615076B2 (en) 1999-10-20 2009-11-10 Anulex Technologies, Inc. Method and apparatus for the treatment of the intervertebral disc annulus
US7004970B2 (en) 1999-10-20 2006-02-28 Anulex Technologies, Inc. Methods and devices for spinal disc annulus reconstruction and repair
DE102004013886A1 (de) * 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
US7782442B2 (en) * 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
DE102017105697A1 (de) * 2017-03-16 2018-09-20 Ev Group E. Thallner Gmbh Verfahren und Vorrichtung zur Ausrichtung zweier optischer Teilsysteme

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5411704B1 (ja) * 1971-03-22 1979-05-17

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015011019A (ja) * 2013-07-02 2015-01-19 株式会社東芝 直流電圧測定装置

Also Published As

Publication number Publication date
DE2428926C2 (de) 1985-11-28
FR2233650A1 (ja) 1975-01-10
JPS5636566B2 (ja) 1981-08-25
US3950094A (en) 1976-04-13
GB1462388A (en) 1977-01-26
DE2428926A1 (de) 1975-01-16
FR2233650B1 (ja) 1976-10-15

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