JPS5017887B2 - - Google Patents
Info
- Publication number
- JPS5017887B2 JPS5017887B2 JP46083032A JP8303271A JPS5017887B2 JP S5017887 B2 JPS5017887 B2 JP S5017887B2 JP 46083032 A JP46083032 A JP 46083032A JP 8303271 A JP8303271 A JP 8303271A JP S5017887 B2 JPS5017887 B2 JP S5017887B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Color Printing (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (ja) | 1971-10-20 | 1971-10-20 | |
| GB4896071A GB1375395A (ja) | 1970-10-24 | 1971-10-21 | |
| DE19712153043 DE2153043A1 (de) | 1970-10-24 | 1971-10-25 | Aufzeichnungsmaterial |
| US420884A US3912831A (en) | 1970-10-24 | 1973-12-03 | Recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (ja) | 1971-10-20 | 1971-10-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4849508A JPS4849508A (ja) | 1973-07-12 |
| JPS5017887B2 true JPS5017887B2 (ja) | 1975-06-25 |
Family
ID=13790874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46083032A Expired JPS5017887B2 (ja) | 1970-10-24 | 1971-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5017887B2 (ja) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5192206A (ja) * | 1975-02-07 | 1976-08-12 | ||
| TWI611255B (zh) * | 2011-08-12 | 2018-01-11 | 三菱瓦斯化學股份有限公司 | 光阻組成物，光阻圖型之形成方法，其所用之多酚化合物及可由其衍生之醇化合物 |
| JP6344607B2 (ja) | 2013-02-08 | 2018-06-20 | 三菱瓦斯化学株式会社 | レジスト組成物、レジストパターン形成方法及びそれに用いるポリフェノール誘導体 |
| EP3239141A4 (en) | 2014-12-25 | 2018-08-15 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, underlayer film forming material for lithography, underlayer film for lithography, pattern forming method and purification method |
| US11256170B2 (en) | 2015-03-31 | 2022-02-22 | Mitsubishi Gas Chemical Company, Inc. | Compound, resist composition, and method for forming resist pattern using it |
| KR102562846B1 (ko) | 2015-03-31 | 2023-08-02 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 레지스트 조성물, 레지스트패턴 형성방법, 및 이것에 이용하는 폴리페놀 화합물 |
| JP7020912B2 (ja) | 2015-08-31 | 2022-02-16 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びその製造方法、並びにレジストパターン形成方法 |
| US11143962B2 (en) | 2015-08-31 | 2021-10-12 | Mitsubishi Gas Chemical Company, Inc. | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method |
| JP6848869B2 (ja) | 2015-09-10 | 2021-03-24 | 三菱瓦斯化学株式会社 | 化合物、樹脂、レジスト組成物又は感放射線性組成物、レジストパターン形成方法、アモルファス膜の製造方法、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、回路パターンの形成方法、及び、精製方法 |
-
1971
- 1971-10-20 JP JP46083032A patent/JPS5017887B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4849508A (ja) | 1973-07-12 |