JPS5017887B2 - - Google Patents
Info
- Publication number
- JPS5017887B2 JPS5017887B2 JP46083032A JP8303271A JPS5017887B2 JP S5017887 B2 JPS5017887 B2 JP S5017887B2 JP 46083032 A JP46083032 A JP 46083032A JP 8303271 A JP8303271 A JP 8303271A JP S5017887 B2 JPS5017887 B2 JP S5017887B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Color Printing (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (cg-RX-API-DMAC7.html) | 1971-10-20 | 1971-10-20 | |
| GB4896071A GB1375395A (cg-RX-API-DMAC7.html) | 1970-10-24 | 1971-10-21 | |
| DE19712153043 DE2153043A1 (de) | 1970-10-24 | 1971-10-25 | Aufzeichnungsmaterial |
| US420884A US3912831A (en) | 1970-10-24 | 1973-12-03 | Recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (cg-RX-API-DMAC7.html) | 1971-10-20 | 1971-10-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4849508A JPS4849508A (cg-RX-API-DMAC7.html) | 1973-07-12 |
| JPS5017887B2 true JPS5017887B2 (cg-RX-API-DMAC7.html) | 1975-06-25 |
Family
ID=13790874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46083032A Expired JPS5017887B2 (cg-RX-API-DMAC7.html) | 1970-10-24 | 1971-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5017887B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5192206A (cg-RX-API-DMAC7.html) * | 1975-02-07 | 1976-08-12 | ||
| KR102082839B1 (ko) * | 2011-08-12 | 2020-02-28 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 레지스트 조성물, 레지스트 패턴 형성방법, 이에 이용되는 폴리페놀 화합물 및 이로부터 유도될 수 있는 알코올 화합물 |
| CN104995559B (zh) | 2013-02-08 | 2020-04-07 | 三菱瓦斯化学株式会社 | 抗蚀剂组合物、抗蚀图案形成方法和用于其的多元酚衍生物 |
| WO2016104214A1 (ja) | 2014-12-25 | 2016-06-30 | 三菱瓦斯化学株式会社 | 化合物、樹脂、リソグラフィー用下層膜形成材料、リソグラフィー用下層膜、パターン形成方法及び精製方法 |
| EP3279190B1 (en) | 2015-03-31 | 2020-08-12 | Mitsubishi Gas Chemical Company, Inc. | Resist composition, method for forming resist pattern, and polyphenol compound used therein |
| CN107533291B (zh) | 2015-03-31 | 2021-06-11 | 三菱瓦斯化学株式会社 | 化合物、抗蚀剂组合物及使用其的抗蚀图案形成方法 |
| CN107924131B (zh) | 2015-08-31 | 2020-12-25 | 三菱瓦斯化学株式会社 | 光刻用下层膜形成材料及其组合物用于形成光刻用下层膜的用途、以及抗蚀图案形成方法 |
| JP6919838B2 (ja) | 2015-08-31 | 2021-08-18 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びその製造方法、パターン形成方法、樹脂、並びに精製方法 |
| KR102687507B1 (ko) | 2015-09-10 | 2024-07-24 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 화합물, 수지, 레지스트 조성물 또는 감방사선성 조성물, 레지스트 패턴 형성방법, 아몰퍼스막의 제조방법, 리소그래피용 하층막 형성재료, 리소그래피용 하층막 형성용 조성물, 회로패턴의 형성방법 및 정제방법 |
| KR20230012474A (ko) | 2020-05-15 | 2023-01-26 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 화합물, (공)중합체, 조성물, 레지스트패턴 형성방법, 그리고 화합물 및 (공)중합체의 제조방법 |
-
1971
- 1971-10-20 JP JP46083032A patent/JPS5017887B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4849508A (cg-RX-API-DMAC7.html) | 1973-07-12 |