JPS5017887B2 - - Google Patents
Info
- Publication number
- JPS5017887B2 JPS5017887B2 JP46083032A JP8303271A JPS5017887B2 JP S5017887 B2 JPS5017887 B2 JP S5017887B2 JP 46083032 A JP46083032 A JP 46083032A JP 8303271 A JP8303271 A JP 8303271A JP S5017887 B2 JPS5017887 B2 JP S5017887B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Color Printing (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (OSRAM) | 1971-10-20 | 1971-10-20 | |
| GB4896071A GB1375395A (OSRAM) | 1970-10-24 | 1971-10-21 | |
| DE19712153043 DE2153043A1 (de) | 1970-10-24 | 1971-10-25 | Aufzeichnungsmaterial |
| US420884A US3912831A (en) | 1970-10-24 | 1973-12-03 | Recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (OSRAM) | 1971-10-20 | 1971-10-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4849508A JPS4849508A (OSRAM) | 1973-07-12 |
| JPS5017887B2 true JPS5017887B2 (OSRAM) | 1975-06-25 |
Family
ID=13790874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46083032A Expired JPS5017887B2 (OSRAM) | 1970-10-24 | 1971-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5017887B2 (OSRAM) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5192206A (OSRAM) * | 1975-02-07 | 1976-08-12 | ||
| TWI611255B (zh) * | 2011-08-12 | 2018-01-11 | 三菱瓦斯化學股份有限公司 | 光阻組成物，光阻圖型之形成方法，其所用之多酚化合物及可由其衍生之醇化合物 |
| CN104995559B (zh) | 2013-02-08 | 2020-04-07 | 三菱瓦斯化学株式会社 | 抗蚀剂组合物、抗蚀图案形成方法和用于其的多元酚衍生物 |
| US10745372B2 (en) | 2014-12-25 | 2020-08-18 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method |
| KR102548109B1 (ko) | 2015-03-31 | 2023-06-27 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 화합물, 레지스트 조성물 및 이것을 이용하는 레지스트패턴 형성방법 |
| US11480877B2 (en) | 2015-03-31 | 2022-10-25 | Mitsubishi Gas Chemical Company, Inc. | Resist composition, method for forming resist pattern, and polyphenol compound used therein |
| CN107924131B (zh) | 2015-08-31 | 2020-12-25 | 三菱瓦斯化学株式会社 | 光刻用下层膜形成材料及其组合物用于形成光刻用下层膜的用途、以及抗蚀图案形成方法 |
| JP6919838B2 (ja) | 2015-08-31 | 2021-08-18 | 三菱瓦斯化学株式会社 | リソグラフィー用下層膜形成材料、リソグラフィー用下層膜形成用組成物、リソグラフィー用下層膜及びその製造方法、パターン形成方法、樹脂、並びに精製方法 |
| US11243467B2 (en) | 2015-09-10 | 2022-02-08 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method |
-
1971
- 1971-10-20 JP JP46083032A patent/JPS5017887B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4849508A (OSRAM) | 1973-07-12 |