JPS5017887B2 - - Google Patents
Info
- Publication number
- JPS5017887B2 JPS5017887B2 JP46083032A JP8303271A JPS5017887B2 JP S5017887 B2 JPS5017887 B2 JP S5017887B2 JP 46083032 A JP46083032 A JP 46083032A JP 8303271 A JP8303271 A JP 8303271A JP S5017887 B2 JPS5017887 B2 JP S5017887B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Color Printing (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (Direct) | 1971-10-20 | 1971-10-20 | |
| GB4896071A GB1375395A (Direct) | 1970-10-24 | 1971-10-21 | |
| DE19712153043 DE2153043A1 (de) | 1970-10-24 | 1971-10-25 | Aufzeichnungsmaterial |
| US420884A US3912831A (en) | 1970-10-24 | 1973-12-03 | Recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46083032A JPS5017887B2 (Direct) | 1971-10-20 | 1971-10-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4849508A JPS4849508A (Direct) | 1973-07-12 |
| JPS5017887B2 true JPS5017887B2 (Direct) | 1975-06-25 |
Family
ID=13790874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46083032A Expired JPS5017887B2 (Direct) | 1970-10-24 | 1971-10-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5017887B2 (Direct) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5192206A (Direct) * | 1975-02-07 | 1976-08-12 | ||
| WO2013024778A1 (ja) * | 2011-08-12 | 2013-02-21 | 三菱瓦斯化学株式会社 | レジスト組成物、レジストパターン形成方法、それに用いるポリフェノール化合物及びそれから誘導され得るアルコール化合物 |
| EP2955575B1 (en) | 2013-02-08 | 2020-07-29 | Mitsubishi Gas Chemical Company, Inc. | Resist composition, resist pattern formation method, and polyphenol derivative used in same |
| EP3239141A4 (en) | 2014-12-25 | 2018-08-15 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, underlayer film forming material for lithography, underlayer film for lithography, pattern forming method and purification method |
| SG11201706306SA (en) | 2015-03-31 | 2017-09-28 | Mitsubishi Gas Chemical Co | Compound, resist composition, and method for forming resist pattern using it |
| KR102562846B1 (ko) | 2015-03-31 | 2023-08-02 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 레지스트 조성물, 레지스트패턴 형성방법, 및 이것에 이용하는 폴리페놀 화합물 |
| EP3346334B1 (en) | 2015-08-31 | 2020-08-12 | Mitsubishi Gas Chemical Company, Inc. | Use of a composition for forming a photoresist underlayer film for lithography, photoresist underlayer film for lithography and method for producing same, and resist pattern forming method |
| US11143962B2 (en) | 2015-08-31 | 2021-10-12 | Mitsubishi Gas Chemical Company, Inc. | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method |
| KR102687507B1 (ko) | 2015-09-10 | 2024-07-24 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 화합물, 수지, 레지스트 조성물 또는 감방사선성 조성물, 레지스트 패턴 형성방법, 아몰퍼스막의 제조방법, 리소그래피용 하층막 형성재료, 리소그래피용 하층막 형성용 조성물, 회로패턴의 형성방법 및 정제방법 |
-
1971
- 1971-10-20 JP JP46083032A patent/JPS5017887B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4849508A (Direct) | 1973-07-12 |