JPS50159447A - - Google Patents

Info

Publication number
JPS50159447A
JPS50159447A JP50053324A JP5332475A JPS50159447A JP S50159447 A JPS50159447 A JP S50159447A JP 50053324 A JP50053324 A JP 50053324A JP 5332475 A JP5332475 A JP 5332475A JP S50159447 A JPS50159447 A JP S50159447A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50053324A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50159447A publication Critical patent/JPS50159447A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP50053324A 1974-05-31 1975-05-06 Pending JPS50159447A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US475005A US3889632A (en) 1974-05-31 1974-05-31 Variable incidence drive for deposition tooling

Publications (1)

Publication Number Publication Date
JPS50159447A true JPS50159447A (en) 1975-12-24

Family

ID=23885855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50053324A Pending JPS50159447A (en) 1974-05-31 1975-05-06

Country Status (5)

Country Link
US (1) US3889632A (en)
JP (1) JPS50159447A (en)
DE (1) DE2513604A1 (en)
FR (1) FR2273372B1 (en)
GB (1) GB1452720A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02305438A (en) * 1989-05-19 1990-12-19 Mitsubishi Electric Corp Vacuum deposition device

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3986478A (en) * 1975-05-15 1976-10-19 Motorola, Inc. Vapor deposition apparatus including orbital substrate holder
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US3983838A (en) * 1975-12-31 1976-10-05 International Business Machines Corporation Planetary evaporator
US4108107A (en) * 1976-04-01 1978-08-22 Airco, Inc. Rotatable substrate holder for use in vacuum
US4237662A (en) * 1978-04-04 1980-12-09 The United States Of America As Represented By The Administrator Of The National Aeronautics & Space Administration Structural members, method and apparatus
US4310614A (en) * 1979-03-19 1982-01-12 Xerox Corporation Method and apparatus for pretreating and depositing thin films on substrates
US4269137A (en) * 1979-03-19 1981-05-26 Xerox Corporation Pretreatment of substrates prior to thin film deposition
DE2944180A1 (en) * 1979-11-02 1981-05-07 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt METHOD FOR PRODUCING AN INSULATION LAYER COVERING A SEMICONDUCTOR BODY ON ONE SIDE
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
GB2139248A (en) * 1983-05-04 1984-11-07 Gen Electric Co Plc Copper alloy solderable contact pad produced by vapour deposition
US4583488A (en) * 1984-03-23 1986-04-22 International Business Machines Corporation Variable axis rotary drive vacuum deposition system
IL74360A (en) * 1984-05-25 1989-01-31 Wedtech Corp Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
JPS61227165A (en) * 1985-03-29 1986-10-09 Mitsubishi Electric Corp Vapor deposition device
US4798165A (en) * 1985-10-07 1989-01-17 Epsilon Apparatus for chemical vapor deposition using an axially symmetric gas flow
US4816133A (en) * 1987-05-14 1989-03-28 Northrop Corporation Apparatus for preparing thin film optical coatings on substrates
DE3803411A1 (en) * 1988-02-05 1989-08-17 Leybold Ag DEVICE FOR HOLDING WORKPIECES
US4937206A (en) * 1989-07-10 1990-06-26 Applied Materials, Inc. Method and apparatus for preventing cross contamination of species during the processing of semiconductor wafers
US5370739A (en) * 1992-06-15 1994-12-06 Materials Research Corporation Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD
DE29505497U1 (en) * 1995-03-31 1995-06-08 Balzers Hochvakuum Coating station
EP0739001B1 (en) * 1995-04-17 2001-02-21 Read-Rite Corporation Deposition of insulating thin film by plurality of ion beams
DE19701419A1 (en) * 1997-01-17 1998-07-23 Geesthacht Gkss Forschung Substrate holding unit
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
KR100797435B1 (en) 2000-06-30 2008-01-24 동경 엘렉트론 주식회사 Lequid processing apparatus
US6595031B2 (en) * 2000-12-19 2003-07-22 Larry Stephen Wilson Retaining device for personal vehicle with handlebars
KR20050072946A (en) * 2004-01-08 2005-07-13 삼성전자주식회사 An apparatus for deposition with high uniformity
TWI280986B (en) * 2004-04-30 2007-05-11 Hon Hai Prec Ind Co Ltd Vacuum vapor deposition apparatus
DE102005035904B4 (en) * 2005-07-28 2012-01-12 Leybold Optics Gmbh Apparatus for treating substrates
CN101876058B (en) * 2010-03-23 2012-07-11 东莞宏威数码机械有限公司 Vacuum evaporation device
US9230846B2 (en) * 2010-06-07 2016-01-05 Veeco Instruments, Inc. Multi-wafer rotating disc reactor with inertial planetary drive
TW201200614A (en) * 2010-06-29 2012-01-01 Hon Hai Prec Ind Co Ltd Coating device
TW201213587A (en) * 2010-09-21 2012-04-01 Hon Hai Prec Ind Co Ltd Conveying mechanism and deposition device with same
CN104084351B (en) * 2014-07-04 2017-05-24 长兴宏能电热膜元件厂 Rotary mechanism for facilitating film spraying of electric heating pipe
JP2018163878A (en) * 2017-03-27 2018-10-18 株式会社日立ハイテクサイエンス Charged particle beam machine
FR3103314B1 (en) * 2019-11-14 2021-10-08 Safran Electronics & Defense TILTING AND ORIENTABLE SUBSTRATE DOOR AND VACUUM MULTILAYER DEPOSIT SYSTEM INCLUDING IT

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1003441A (en) * 1910-11-04 1911-09-19 Levi F Eaton Blackleading-machine.
US2369155A (en) * 1941-12-22 1945-02-13 Marinsky Davis Method of conditioning wound strand bodies
US2804976A (en) * 1954-02-03 1957-09-03 Kaiser Aluminium Chem Corp Method and apparatus for treating material
US2824029A (en) * 1956-03-16 1958-02-18 Magnus Chemical Company Inc Method and apparatus for washing machine parts
US3046157A (en) * 1958-05-07 1962-07-24 Philips Corp Method for coating the inner wall of a tube intended for electric discharge lamps with a uniform liquid layer as well as an arrangement for the application of the method
US3131917A (en) * 1958-09-09 1964-05-05 Gessner Siegfried Device for adjusting the spatial position of articles to be treated in a treatment chamber
US2997979A (en) * 1958-09-15 1961-08-29 Tassara Luigi Apparatus for applying metallic film to electrical components and the like
US3236205A (en) * 1961-04-24 1966-02-22 Baird Atomic Inc High temperature furnace
US3297475A (en) * 1963-05-27 1967-01-10 New York Air Brake Co Coating method and apparatus employing rotating workholder
US3673984A (en) * 1970-08-28 1972-07-04 Dart Ind Inc Dip coating machine
US3752691A (en) * 1971-06-29 1973-08-14 Xerox Corp Method of vacuum evaporation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02305438A (en) * 1989-05-19 1990-12-19 Mitsubishi Electric Corp Vacuum deposition device

Also Published As

Publication number Publication date
FR2273372B1 (en) 1977-04-15
GB1452720A (en) 1976-10-13
DE2513604A1 (en) 1975-12-11
US3889632A (en) 1975-06-17
FR2273372A1 (en) 1975-12-26

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