JPS50158281A - - Google Patents
Info
- Publication number
- JPS50158281A JPS50158281A JP6505574A JP6505574A JPS50158281A JP S50158281 A JPS50158281 A JP S50158281A JP 6505574 A JP6505574 A JP 6505574A JP 6505574 A JP6505574 A JP 6505574A JP S50158281 A JPS50158281 A JP S50158281A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6505574A JPS50158281A (zh) | 1974-06-10 | 1974-06-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6505574A JPS50158281A (zh) | 1974-06-10 | 1974-06-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50158281A true JPS50158281A (zh) | 1975-12-22 |
Family
ID=13275871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6505574A Pending JPS50158281A (zh) | 1974-06-10 | 1974-06-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50158281A (zh) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0665582A2 (en) * | 1994-01-28 | 1995-08-02 | Wako Pure Chemical Industries Ltd | Surface treating agents and treating process for semiconductors |
| JPWO2001071789A1 (ja) * | 2000-03-21 | 2004-03-04 | 和光純薬工業株式会社 | 半導体基板洗浄剤及び洗浄方法 |
| JP2010232406A (ja) * | 2009-03-27 | 2010-10-14 | Hikari Kobayashi | 半導体基板の処理方法および半導体装置の製造方法。 |
| EP2557147A1 (en) | 2011-08-09 | 2013-02-13 | Basf Se | Aqueous alkaline compositions and method for treating the surface of silicon substrates |
| US9076920B2 (en) | 2010-06-09 | 2015-07-07 | Basf Se | Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates |
-
1974
- 1974-06-10 JP JP6505574A patent/JPS50158281A/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0665582A2 (en) * | 1994-01-28 | 1995-08-02 | Wako Pure Chemical Industries Ltd | Surface treating agents and treating process for semiconductors |
| US5580846A (en) * | 1994-01-28 | 1996-12-03 | Wako Pure Chemical Industries, Ltd. | Surface treating agents and treating process for semiconductors |
| EP0665582B1 (en) * | 1994-01-28 | 2001-03-14 | Wako Pure Chemical Industries Ltd | Surface treating agents and treating process for semiconductors |
| JPWO2001071789A1 (ja) * | 2000-03-21 | 2004-03-04 | 和光純薬工業株式会社 | 半導体基板洗浄剤及び洗浄方法 |
| JP4821082B2 (ja) * | 2000-03-21 | 2011-11-24 | 和光純薬工業株式会社 | 半導体基板洗浄剤及び洗浄方法 |
| JP2010232406A (ja) * | 2009-03-27 | 2010-10-14 | Hikari Kobayashi | 半導体基板の処理方法および半導体装置の製造方法。 |
| US9076920B2 (en) | 2010-06-09 | 2015-07-07 | Basf Se | Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates |
| EP2557147A1 (en) | 2011-08-09 | 2013-02-13 | Basf Se | Aqueous alkaline compositions and method for treating the surface of silicon substrates |