JPS50156879A - - Google Patents
Info
- Publication number
- JPS50156879A JPS50156879A JP50057141A JP5714175A JPS50156879A JP S50156879 A JPS50156879 A JP S50156879A JP 50057141 A JP50057141 A JP 50057141A JP 5714175 A JP5714175 A JP 5714175A JP S50156879 A JPS50156879 A JP S50156879A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10P95/00—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742422982 DE2422982C2 (de) | 1974-05-13 | Verfahren zum Ausrichten einer Fotomaske, insbesondere zum Erzeugen von Feinststrukturen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50156879A true JPS50156879A (Direct) | 1975-12-18 |
Family
ID=5915331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50057141A Pending JPS50156879A (Direct) | 1974-05-13 | 1975-05-12 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS50156879A (Direct) |
| BE (1) | BE829001A (Direct) |
| FR (1) | FR2271667B1 (Direct) |
| GB (1) | GB1501158A (Direct) |
| IT (1) | IT1038007B (Direct) |
| NL (1) | NL7505324A (Direct) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57112021A (en) * | 1980-12-29 | 1982-07-12 | Fujitsu Ltd | Manufacture of semiconductor device |
-
1975
- 1975-04-28 GB GB17504/75A patent/GB1501158A/en not_active Expired
- 1975-05-06 NL NL7505324A patent/NL7505324A/xx unknown
- 1975-05-09 FR FR7514519A patent/FR2271667B1/fr not_active Expired
- 1975-05-12 JP JP50057141A patent/JPS50156879A/ja active Pending
- 1975-05-12 IT IT23195/75A patent/IT1038007B/it active
- 1975-05-13 BE BE156288A patent/BE829001A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NL7505324A (nl) | 1975-11-17 |
| IT1038007B (it) | 1979-11-20 |
| GB1501158A (en) | 1978-02-15 |
| DE2422982B1 (de) | 1975-08-14 |
| FR2271667A1 (Direct) | 1975-12-12 |
| BE829001A (fr) | 1975-09-01 |
| FR2271667B1 (Direct) | 1977-04-15 |