FR2271667A1 - - Google Patents

Info

Publication number
FR2271667A1
FR2271667A1 FR7514519A FR7514519A FR2271667A1 FR 2271667 A1 FR2271667 A1 FR 2271667A1 FR 7514519 A FR7514519 A FR 7514519A FR 7514519 A FR7514519 A FR 7514519A FR 2271667 A1 FR2271667 A1 FR 2271667A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7514519A
Other languages
French (fr)
Other versions
FR2271667B1 (Direct
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742422982 external-priority patent/DE2422982C2/de
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of FR2271667A1 publication Critical patent/FR2271667A1/fr
Application granted granted Critical
Publication of FR2271667B1 publication Critical patent/FR2271667B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7514519A 1974-05-13 1975-05-09 Expired FR2271667B1 (Direct)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742422982 DE2422982C2 (de) 1974-05-13 Verfahren zum Ausrichten einer Fotomaske, insbesondere zum Erzeugen von Feinststrukturen

Publications (2)

Publication Number Publication Date
FR2271667A1 true FR2271667A1 (Direct) 1975-12-12
FR2271667B1 FR2271667B1 (Direct) 1977-04-15

Family

ID=5915331

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7514519A Expired FR2271667B1 (Direct) 1974-05-13 1975-05-09

Country Status (6)

Country Link
JP (1) JPS50156879A (Direct)
BE (1) BE829001A (Direct)
FR (1) FR2271667B1 (Direct)
GB (1) GB1501158A (Direct)
IT (1) IT1038007B (Direct)
NL (1) NL7505324A (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0061536A1 (en) * 1980-12-29 1982-10-06 Fujitsu Limited Method of manufacturing a semiconductor device having improved alignment marks and alignment marks for said method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0061536A1 (en) * 1980-12-29 1982-10-06 Fujitsu Limited Method of manufacturing a semiconductor device having improved alignment marks and alignment marks for said method

Also Published As

Publication number Publication date
NL7505324A (nl) 1975-11-17
JPS50156879A (Direct) 1975-12-18
IT1038007B (it) 1979-11-20
GB1501158A (en) 1978-02-15
DE2422982B1 (de) 1975-08-14
BE829001A (fr) 1975-09-01
FR2271667B1 (Direct) 1977-04-15

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Legal Events

Date Code Title Description
ST Notification of lapse