JPS50150373A - - Google Patents
Info
- Publication number
- JPS50150373A JPS50150373A JP5658774A JP5658774A JPS50150373A JP S50150373 A JPS50150373 A JP S50150373A JP 5658774 A JP5658774 A JP 5658774A JP 5658774 A JP5658774 A JP 5658774A JP S50150373 A JPS50150373 A JP S50150373A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5658774A JPS5314470B2 (enExample) | 1974-05-22 | 1974-05-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5658774A JPS5314470B2 (enExample) | 1974-05-22 | 1974-05-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50150373A true JPS50150373A (enExample) | 1975-12-02 |
| JPS5314470B2 JPS5314470B2 (enExample) | 1978-05-17 |
Family
ID=13031299
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5658774A Expired JPS5314470B2 (enExample) | 1974-05-22 | 1974-05-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5314470B2 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS546466A (en) * | 1977-06-17 | 1979-01-18 | Hitachi Ltd | Surface cleaning method |
| JPS5421265A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Forming method of semiconductor oxide film |
| JP2010171128A (ja) * | 2009-01-21 | 2010-08-05 | Tokyo Electron Ltd | 酸化珪素膜の形成方法、半導体メモリ装置の製造方法およびコンピュータ読み取り可能な記憶媒体 |
-
1974
- 1974-05-22 JP JP5658774A patent/JPS5314470B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS546466A (en) * | 1977-06-17 | 1979-01-18 | Hitachi Ltd | Surface cleaning method |
| JPS5421265A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Forming method of semiconductor oxide film |
| JP2010171128A (ja) * | 2009-01-21 | 2010-08-05 | Tokyo Electron Ltd | 酸化珪素膜の形成方法、半導体メモリ装置の製造方法およびコンピュータ読み取り可能な記憶媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5314470B2 (enExample) | 1978-05-17 |