JPS50140064A - - Google Patents
Info
- Publication number
- JPS50140064A JPS50140064A JP50031250A JP3125075A JPS50140064A JP S50140064 A JPS50140064 A JP S50140064A JP 50031250 A JP50031250 A JP 50031250A JP 3125075 A JP3125075 A JP 3125075A JP S50140064 A JPS50140064 A JP S50140064A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Electron Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/462,688 US3987215A (en) | 1974-04-22 | 1974-04-22 | Resist mask formation process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50140064A true JPS50140064A (enExample) | 1975-11-10 |
| JPS5838933B2 JPS5838933B2 (ja) | 1983-08-26 |
Family
ID=23837404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50031250A Expired JPS5838933B2 (ja) | 1974-04-22 | 1975-03-17 | ハンドウタイデバイスノ セイゾウホウホウ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3987215A (enExample) |
| JP (1) | JPS5838933B2 (enExample) |
| DE (1) | DE2459156C3 (enExample) |
| FR (1) | FR2268284B1 (enExample) |
| GB (1) | GB1459988A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63165844A (ja) * | 1986-12-27 | 1988-07-09 | Terumo Corp | レジスト材料 |
| JP2012083727A (ja) * | 2010-09-17 | 2012-04-26 | Fujifilm Corp | パターン形成方法 |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4024293A (en) * | 1975-12-10 | 1977-05-17 | International Business Machines Corporation | High sensitivity resist system for lift-off metallization |
| US4061829A (en) * | 1976-04-26 | 1977-12-06 | Bell Telephone Laboratories, Incorporated | Negative resist for X-ray and electron beam lithography and method of using same |
| US4099062A (en) * | 1976-12-27 | 1978-07-04 | International Business Machines Corporation | Electron beam lithography process |
| US4156745A (en) * | 1978-04-03 | 1979-05-29 | International Business Machines Corporation | Electron sensitive resist and a method preparing the same |
| JPS5568630A (en) * | 1978-11-17 | 1980-05-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Pattern formation |
| US4609252A (en) * | 1979-04-02 | 1986-09-02 | Hughes Aircraft Company | Organic optical waveguide device and method of making |
| US4330614A (en) * | 1980-10-14 | 1982-05-18 | International Business Machines Corporation | Process for forming a patterned resist mask |
| US4415653A (en) * | 1981-05-07 | 1983-11-15 | Honeywell Inc. | Method of making sensitive positive electron beam resists |
| JPS58187926A (ja) * | 1982-04-28 | 1983-11-02 | Toyo Soda Mfg Co Ltd | 放射線ネガ型レジストの現像方法 |
| DE3472574D1 (en) * | 1983-10-14 | 1988-08-11 | Hitachi Ltd | Process for forming an organic thin film |
| US4591546A (en) * | 1984-06-11 | 1986-05-27 | General Electric Company | Spin castable resist composition and use |
| DE3828551C3 (de) * | 1988-08-23 | 1995-02-23 | Du Pont Deutschland | Verfahren zur Herstellung von flexographischen Druckformen |
| DE68926242T2 (de) | 1988-08-23 | 1996-09-19 | Du Pont | Verfahren zur herstellung von flexographischen druckreliefs |
| US5354645A (en) * | 1988-08-23 | 1994-10-11 | E. I. Du Pont De Nemours And Company | Process for the production of flexographic printing reliefs |
| JPH02273412A (ja) * | 1989-04-14 | 1990-11-07 | Sumitomo Electric Ind Ltd | 架空配電線用被覆電線 |
| TW395331U (en) * | 1995-12-28 | 2000-06-21 | Seiko Epson Corp | Electronic machine |
| US6426177B2 (en) * | 1998-08-11 | 2002-07-30 | International Business Machines Corporation | Single component developer for use with ghost exposure |
| CA2377081A1 (en) * | 2002-03-15 | 2003-09-15 | Quantiscript Inc. | Method of producing an etch-resistant polymer structure using electron beam lithography |
| US20100068651A1 (en) * | 2008-09-16 | 2010-03-18 | Bradford David C | Developing solution for flexographic printing plates |
| US9625815B2 (en) | 2013-09-27 | 2017-04-18 | Intel Corporation | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2670287A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
| US2670286A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
| US2892712A (en) * | 1954-04-23 | 1959-06-30 | Du Pont | Process for preparing relief images |
| GB1168445A (en) * | 1966-05-26 | 1969-10-22 | Howson Ltd W H | Improvements in or relating to Presensitised Printing Plates |
| US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
| SE361366B (enExample) * | 1968-10-03 | 1973-10-29 | Western Electric Co | |
| US3679497A (en) * | 1969-10-24 | 1972-07-25 | Westinghouse Electric Corp | Electron beam fabrication system and process for use thereof |
| US3779806A (en) * | 1972-03-24 | 1973-12-18 | Ibm | Electron beam sensitive polymer t-butyl methacrylate resist |
-
1974
- 1974-04-22 US US05/462,688 patent/US3987215A/en not_active Expired - Lifetime
- 1974-12-14 DE DE2459156A patent/DE2459156C3/de not_active Expired
-
1975
- 1975-03-06 FR FR7507777A patent/FR2268284B1/fr not_active Expired
- 1975-03-17 JP JP50031250A patent/JPS5838933B2/ja not_active Expired
- 1975-04-02 GB GB1354275A patent/GB1459988A/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63165844A (ja) * | 1986-12-27 | 1988-07-09 | Terumo Corp | レジスト材料 |
| JP2012083727A (ja) * | 2010-09-17 | 2012-04-26 | Fujifilm Corp | パターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2459156B2 (de) | 1981-05-21 |
| US3987215A (en) | 1976-10-19 |
| DE2459156C3 (de) | 1982-02-18 |
| FR2268284B1 (enExample) | 1981-09-25 |
| GB1459988A (en) | 1976-12-31 |
| JPS5838933B2 (ja) | 1983-08-26 |
| DE2459156A1 (de) | 1975-11-06 |
| FR2268284A1 (enExample) | 1975-11-14 |