JPS50114179A - - Google Patents
Info
- Publication number
- JPS50114179A JPS50114179A JP1879474A JP1879474A JPS50114179A JP S50114179 A JPS50114179 A JP S50114179A JP 1879474 A JP1879474 A JP 1879474A JP 1879474 A JP1879474 A JP 1879474A JP S50114179 A JPS50114179 A JP S50114179A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1879474A JPS5337188B2 (ja�@�@) | 1974-02-15 | 1974-02-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1879474A JPS5337188B2 (ja�@�@) | 1974-02-15 | 1974-02-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50114179A true JPS50114179A (ja�@�@) | 1975-09-06 |
| JPS5337188B2 JPS5337188B2 (ja�@�@) | 1978-10-06 |
Family
ID=11981490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1879474A Expired JPS5337188B2 (ja�@�@) | 1974-02-15 | 1974-02-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5337188B2 (ja�@�@) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5372571A (en) * | 1976-12-10 | 1978-06-28 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
| JPS5372572A (en) * | 1976-12-10 | 1978-06-28 | Mitsubishi Electric Corp | Manufacturing device for semiconductor device |
| FR2382931A1 (fr) * | 1977-03-09 | 1978-10-06 | Atomel Corp | Procede et appareil de traitement chimique en phase gazeuse a pression et temperature elevees |
| JPS5515258A (en) * | 1978-07-19 | 1980-02-02 | Nec Corp | Heat treatment apparatus for semiconductor substrate |
| JPH0382125A (ja) * | 1989-08-25 | 1991-04-08 | Fujitsu Ltd | 半導体装置の製造方法 |
| US5664504A (en) * | 1994-10-27 | 1997-09-09 | Kobayashi; Shizuo | Combustion apparatus having inverse temperature distribution by forced convection |
-
1974
- 1974-02-15 JP JP1879474A patent/JPS5337188B2/ja not_active Expired
Non-Patent Citations (2)
| Title |
|---|
| EXTENDED ABSTRACTS=1973 * |
| FERRITES=1971 * |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5372571A (en) * | 1976-12-10 | 1978-06-28 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
| JPS5372572A (en) * | 1976-12-10 | 1978-06-28 | Mitsubishi Electric Corp | Manufacturing device for semiconductor device |
| FR2382931A1 (fr) * | 1977-03-09 | 1978-10-06 | Atomel Corp | Procede et appareil de traitement chimique en phase gazeuse a pression et temperature elevees |
| JPS5515258A (en) * | 1978-07-19 | 1980-02-02 | Nec Corp | Heat treatment apparatus for semiconductor substrate |
| JPH0382125A (ja) * | 1989-08-25 | 1991-04-08 | Fujitsu Ltd | 半導体装置の製造方法 |
| US5664504A (en) * | 1994-10-27 | 1997-09-09 | Kobayashi; Shizuo | Combustion apparatus having inverse temperature distribution by forced convection |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5337188B2 (ja�@�@) | 1978-10-06 |