JPS50113171A - - Google Patents
Info
- Publication number
- JPS50113171A JPS50113171A JP1736174A JP1736174A JPS50113171A JP S50113171 A JPS50113171 A JP S50113171A JP 1736174 A JP1736174 A JP 1736174A JP 1736174 A JP1736174 A JP 1736174A JP S50113171 A JPS50113171 A JP S50113171A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1736174A JPS50113171A (es) | 1974-02-13 | 1974-02-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1736174A JPS50113171A (es) | 1974-02-13 | 1974-02-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS50113171A true JPS50113171A (es) | 1975-09-05 |
Family
ID=11941887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1736174A Pending JPS50113171A (es) | 1974-02-13 | 1974-02-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS50113171A (es) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5376757A (en) * | 1976-12-20 | 1978-07-07 | Oki Electric Ind Co Ltd | Photoetching method |
| JPS5389673A (en) * | 1977-01-19 | 1978-08-07 | Oki Electric Ind Co Ltd | Fine pattern forming method of semiconductor device |
| JPS5568626A (en) * | 1978-11-17 | 1980-05-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Pattern formation |
| JPS55140229A (en) * | 1979-04-20 | 1980-11-01 | Hitachi Ltd | Method for formation of fine pattern |
| JPS564236A (en) * | 1979-06-25 | 1981-01-17 | Nec Corp | Manufacture of photoresist film pattern |
| JPS5694351A (en) * | 1979-12-26 | 1981-07-30 | Perkin Elmer Corp | Mask for xxray lithograph and production thereof |
| JPS57172735A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
| JPS57172736A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
| JPS5851517A (ja) * | 1981-09-22 | 1983-03-26 | Fujitsu Ltd | フォトエッチング方法 |
| JPS58100428A (ja) * | 1981-12-10 | 1983-06-15 | Matsushita Electronics Corp | パタ−ン形成方法 |
-
1974
- 1974-02-13 JP JP1736174A patent/JPS50113171A/ja active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5376757A (en) * | 1976-12-20 | 1978-07-07 | Oki Electric Ind Co Ltd | Photoetching method |
| JPS5389673A (en) * | 1977-01-19 | 1978-08-07 | Oki Electric Ind Co Ltd | Fine pattern forming method of semiconductor device |
| JPS5568626A (en) * | 1978-11-17 | 1980-05-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Pattern formation |
| JPS55140229A (en) * | 1979-04-20 | 1980-11-01 | Hitachi Ltd | Method for formation of fine pattern |
| JPS564236A (en) * | 1979-06-25 | 1981-01-17 | Nec Corp | Manufacture of photoresist film pattern |
| JPS5694351A (en) * | 1979-12-26 | 1981-07-30 | Perkin Elmer Corp | Mask for xxray lithograph and production thereof |
| JPH0142134B2 (es) * | 1979-12-26 | 1989-09-11 | Perkin Elmer Corp | |
| JPS57172735A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
| JPS57172736A (en) * | 1981-03-30 | 1982-10-23 | Yokogawa Hewlett Packard Ltd | Multilayer photoresist processing |
| JPS6358367B2 (es) * | 1981-03-30 | 1988-11-15 | Yokogawa Hyuuretsuto Patsukaado Kk | |
| JPS5851517A (ja) * | 1981-09-22 | 1983-03-26 | Fujitsu Ltd | フォトエッチング方法 |
| JPS58100428A (ja) * | 1981-12-10 | 1983-06-15 | Matsushita Electronics Corp | パタ−ン形成方法 |