JPS50105074A - - Google Patents
Info
- Publication number
- JPS50105074A JPS50105074A JP744575A JP744575A JPS50105074A JP S50105074 A JPS50105074 A JP S50105074A JP 744575 A JP744575 A JP 744575A JP 744575 A JP744575 A JP 744575A JP S50105074 A JPS50105074 A JP S50105074A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/308—Chemical or electrical treatment, e.g. electrolytic etching using masks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/02—Other than completely through work thickness
- Y10T83/0333—Scoring
- Y10T83/0341—Processes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Dicing (AREA)
- Electronic Switches (AREA)
- Push-Button Switches (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2541/74A GB1487201A (en) | 1974-12-20 | 1974-12-20 | Method of manufacturing semi-conductor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50105074A true JPS50105074A (en, 2012) | 1975-08-19 |
Family
ID=9741400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP744575A Pending JPS50105074A (en, 2012) | 1974-12-20 | 1975-01-18 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3953919A (en, 2012) |
JP (1) | JPS50105074A (en, 2012) |
CA (1) | CA1037876A (en, 2012) |
DE (1) | DE2501532A1 (en, 2012) |
FR (1) | FR2258707B1 (en, 2012) |
GB (1) | GB1487201A (en, 2012) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7609815A (nl) * | 1976-09-03 | 1978-03-07 | Philips Nv | Werkwijze voor het vervaardigen van een half- geleiderinrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze. |
DE3044947A1 (de) * | 1980-11-28 | 1982-07-01 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung sehr duenner halbleiterchips |
EP0095300B1 (en) * | 1982-05-25 | 1987-10-21 | Plessey Overseas Limited | Vehicle mounted doppler radar system |
SE8306663L (sv) * | 1982-12-08 | 1984-06-09 | Int Rectifier Corp | Forfarande for framstellning av halvledaranordning |
DE3334095A1 (de) * | 1983-09-21 | 1985-04-11 | Brown, Boveri & Cie Ag, 6800 Mannheim | Verfahren zum aetzen tiefer graeben in siliziumscheiben mit glatter oberflaeche |
TW230830B (en, 2012) * | 1991-11-01 | 1994-09-21 | Furukawa Electric Co Ltd | |
US6127245A (en) | 1997-02-04 | 2000-10-03 | Micron Technology, Inc. | Grinding technique for integrated circuits |
US6017804A (en) * | 1998-01-09 | 2000-01-25 | Lucent Technologies Inc. | Method and apparatus for cleaving semiconductor material |
US6074934A (en) * | 1998-11-20 | 2000-06-13 | Lucent Technologies Inc. | Apparatus for cleaving laser bars |
US6102267A (en) * | 1998-12-10 | 2000-08-15 | Lucent Technologies, Inc. | Method and apparatus for non-contact pulsating jet cleaving of a semiconductor material |
JP2004063803A (ja) * | 2002-07-29 | 2004-02-26 | Ngk Spark Plug Co Ltd | プリント配線基板の製造方法、プリント配線基板製造用金属板、連結プリント配線基板 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3497948A (en) * | 1967-09-05 | 1970-03-03 | Transistor Automation Corp | Method and apparatus for sorting semi-conductor devices |
US3496617A (en) * | 1967-11-08 | 1970-02-24 | Us Navy | Technique for curving piezoelectric ceramics |
GB1248584A (en) * | 1968-03-05 | 1971-10-06 | Lucas Industries Ltd | Thyristors and other semi-conductor devices |
US3677875A (en) * | 1970-08-19 | 1972-07-18 | Raychem Corp | Method and means of die matrix expansion |
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1974
- 1974-12-20 GB GB2541/74A patent/GB1487201A/en not_active Expired
- 1974-12-30 US US05/537,339 patent/US3953919A/en not_active Expired - Lifetime
-
1975
- 1975-01-16 DE DE19752501532 patent/DE2501532A1/de not_active Ceased
- 1975-01-16 FR FR7502012A patent/FR2258707B1/fr not_active Expired
- 1975-01-18 JP JP744575A patent/JPS50105074A/ja active Pending
- 1975-08-19 CA CA233,996A patent/CA1037876A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2258707A1 (en, 2012) | 1975-08-18 |
FR2258707B1 (en, 2012) | 1976-12-31 |
GB1487201A (en) | 1977-09-28 |
CA1037876A (en) | 1978-09-05 |
DE2501532A1 (de) | 1975-07-24 |
US3953919A (en) | 1976-05-04 |