JPS5010081A - - Google Patents

Info

Publication number
JPS5010081A
JPS5010081A JP49031104A JP3110474A JPS5010081A JP S5010081 A JPS5010081 A JP S5010081A JP 49031104 A JP49031104 A JP 49031104A JP 3110474 A JP3110474 A JP 3110474A JP S5010081 A JPS5010081 A JP S5010081A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49031104A
Other languages
Japanese (ja)
Other versions
JPS5247305B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5010081A publication Critical patent/JPS5010081A/ja
Publication of JPS5247305B2 publication Critical patent/JPS5247305B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02225Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Compounds (AREA)
JP49031104A 1973-03-24 1974-03-20 Expired JPS5247305B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2314746A DE2314746C2 (de) 1973-03-24 1973-03-24 Verfahren zum thermischen Oxydieren von Silicium unter Zusatz einer Chlorkohlenstoffverbindung

Publications (2)

Publication Number Publication Date
JPS5010081A true JPS5010081A (de) 1975-02-01
JPS5247305B2 JPS5247305B2 (de) 1977-12-01

Family

ID=5875788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49031104A Expired JPS5247305B2 (de) 1973-03-24 1974-03-20

Country Status (6)

Country Link
JP (1) JPS5247305B2 (de)
CA (1) CA1020849A (de)
DE (1) DE2314746C2 (de)
FR (1) FR2222312B1 (de)
GB (1) GB1447184A (de)
IT (1) IT1003483B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5690528A (en) * 1979-12-22 1981-07-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Surface treatment of semiconductor device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5139869A (en) * 1988-09-01 1992-08-18 Wolfgang Euen Thin dielectric layer on a substrate
US5268311A (en) * 1988-09-01 1993-12-07 International Business Machines Corporation Method for forming a thin dielectric layer on a substrate
EP0356557B1 (de) * 1988-09-01 1994-12-21 International Business Machines Corporation Dünne dielektrische Schicht auf einem Substrat und Verfahren zu deren Herstellung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5690528A (en) * 1979-12-22 1981-07-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Surface treatment of semiconductor device

Also Published As

Publication number Publication date
JPS5247305B2 (de) 1977-12-01
IT1003483B (it) 1976-06-10
GB1447184A (en) 1976-08-25
FR2222312B1 (de) 1976-12-03
DE2314746A1 (de) 1974-09-26
CA1020849A (en) 1977-11-15
FR2222312A1 (de) 1974-10-18
DE2314746C2 (de) 1983-11-17

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