JPS4996675A - - Google Patents

Info

Publication number
JPS4996675A
JPS4996675A JP48007207A JP720773A JPS4996675A JP S4996675 A JPS4996675 A JP S4996675A JP 48007207 A JP48007207 A JP 48007207A JP 720773 A JP720773 A JP 720773A JP S4996675 A JPS4996675 A JP S4996675A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48007207A
Other languages
Japanese (ja)
Other versions
JPS5612011B2 (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP720773A priority Critical patent/JPS5612011B2/ja
Priority to GB3728276A priority patent/GB1461472A/en
Priority to GB25274A priority patent/GB1461471A/en
Priority to FR7401340A priority patent/FR2224787B1/fr
Priority to DE19742401998 priority patent/DE2401998C2/de
Publication of JPS4996675A publication Critical patent/JPS4996675A/ja
Priority to US05/629,561 priority patent/US4032341A/en
Priority to US05/785,047 priority patent/US4083634A/en
Publication of JPS5612011B2 publication Critical patent/JPS5612011B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Current Or Voltage (AREA)
JP720773A 1973-01-16 1973-01-16 Expired JPS5612011B2 (cs)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (cs) 1973-01-16 1973-01-16
GB3728276A GB1461472A (en) 1973-01-16 1974-01-03 Apparatus for imagewise exposing a layer of photosensitive material
GB25274A GB1461471A (en) 1973-01-16 1974-01-03 Exposure method
FR7401340A FR2224787B1 (cs) 1973-01-16 1974-01-15
DE19742401998 DE2401998C2 (de) 1973-01-16 1974-01-16 Kopierverfahren, insbesondere für die Herstellung von integrierten Schaltungen
US05/629,561 US4032341A (en) 1973-01-16 1975-11-06 Pattern exposure using a polychromatic light source
US05/785,047 US4083634A (en) 1973-01-16 1977-04-06 Pattern exposure apparatus using polychromatic light source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (cs) 1973-01-16 1973-01-16

Publications (2)

Publication Number Publication Date
JPS4996675A true JPS4996675A (cs) 1974-09-12
JPS5612011B2 JPS5612011B2 (cs) 1981-03-18

Family

ID=11659554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP720773A Expired JPS5612011B2 (cs) 1973-01-16 1973-01-16

Country Status (4)

Country Link
JP (1) JPS5612011B2 (cs)
DE (1) DE2401998C2 (cs)
FR (1) FR2224787B1 (cs)
GB (2) GB1461472A (cs)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576630A (en) * 1966-10-29 1971-04-27 Nippon Electric Co Photo-etching process
DE1614636A1 (de) * 1967-09-23 1971-02-25 Siemens Ag Verfahren zum Herstellen einer Fotolackmaske fuer Halbleiterzwecke
CH484517A (de) * 1968-06-28 1970-01-15 Ibm Verfahren zum Aufbringen eines Stoffes auf einen begrenzten Oberflächenbereich eines Halbleiters
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung

Also Published As

Publication number Publication date
GB1461471A (en) 1977-01-13
FR2224787B1 (cs) 1980-01-11
DE2401998C2 (de) 1983-04-14
FR2224787A1 (cs) 1974-10-31
JPS5612011B2 (cs) 1981-03-18
DE2401998A1 (de) 1974-07-25
GB1461472A (en) 1977-01-13

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