JPS4988603A - - Google Patents
Info
- Publication number
- JPS4988603A JPS4988603A JP253873A JP253873A JPS4988603A JP S4988603 A JPS4988603 A JP S4988603A JP 253873 A JP253873 A JP 253873A JP 253873 A JP253873 A JP 253873A JP S4988603 A JPS4988603 A JP S4988603A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP253873A JPS4988603A (pt) | 1972-12-29 | 1972-12-29 | |
| DE2364631A DE2364631A1 (de) | 1972-12-29 | 1973-12-24 | Entwicklerzusammensetzung fuer ein lichtempfindliches lithographisches druckmaterial |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP253873A JPS4988603A (pt) | 1972-12-29 | 1972-12-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4988603A true JPS4988603A (pt) | 1974-08-24 |
Family
ID=11532143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP253873A Pending JPS4988603A (pt) | 1972-12-29 | 1972-12-29 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS4988603A (pt) |
| DE (1) | DE2364631A1 (pt) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| CN111308866A (zh) * | 2020-04-01 | 2020-06-19 | 烟台核晶陶瓷新材料有限公司 | 一种用于坩埚检测的显影溶液及其制备方法和使用方法 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2817256A1 (de) * | 1977-05-06 | 1978-11-09 | Allied Chem | Verfahren zur entwicklung einer mit fotoaetzgrund bedeckten flaeche |
| DE2809774A1 (de) * | 1978-03-07 | 1979-09-13 | Hoechst Ag | Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten |
| DE2849894A1 (de) * | 1978-11-17 | 1980-05-29 | Hoechst Ag | Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen |
| JPS5587151A (en) * | 1978-12-25 | 1980-07-01 | Mitsubishi Chem Ind Ltd | Developing solution composition for lithographic printing plate |
| DE2941960A1 (de) * | 1979-10-17 | 1981-04-30 | Hoechst Ag, 6000 Frankfurt | Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten |
| US4670372A (en) * | 1984-10-15 | 1987-06-02 | Petrarch Systems, Inc. | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant |
| DE3543961A1 (de) * | 1984-12-12 | 1986-06-12 | Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa | Verfahren zur herstellung trockener druckplatten fuer den flachdruck und entwicklerloesung zur verwendung in demselben |
| US4592992A (en) * | 1985-04-11 | 1986-06-03 | American Hoechst Corporation | Developer compositions for lithographic plates |
| DE3523176A1 (de) * | 1985-06-28 | 1987-01-08 | Hoechst Ag | Strahlungsempfindliche beschichtungsloesung und verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger |
-
1972
- 1972-12-29 JP JP253873A patent/JPS4988603A/ja active Pending
-
1973
- 1973-12-24 DE DE2364631A patent/DE2364631A1/de active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5405720A (en) * | 1985-08-07 | 1995-04-11 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| US5494784A (en) * | 1985-08-07 | 1996-02-27 | Japan Synthetic Rubber Co., Ltd. | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
| US6228554B1 (en) | 1985-08-07 | 2001-05-08 | Jsr Corporation | Radiation-sensitive resin composition |
| US6270939B1 (en) | 1985-08-07 | 2001-08-07 | Jsr Corporation | Radiation-sensitive resin composition |
| CN111308866A (zh) * | 2020-04-01 | 2020-06-19 | 烟台核晶陶瓷新材料有限公司 | 一种用于坩埚检测的显影溶液及其制备方法和使用方法 |
| CN111308866B (zh) * | 2020-04-01 | 2023-08-22 | 烟台核晶陶瓷新材料有限公司 | 一种用于坩埚检测的显影溶液及其制备方法和使用方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2364631A1 (de) | 1974-07-04 |