JPS498831A - - Google Patents
Info
- Publication number
- JPS498831A JPS498831A JP5073572A JP5073572A JPS498831A JP S498831 A JPS498831 A JP S498831A JP 5073572 A JP5073572 A JP 5073572A JP 5073572 A JP5073572 A JP 5073572A JP S498831 A JPS498831 A JP S498831A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Tunnel Furnaces (AREA)
- Furnace Details (AREA)
- Resistance Heating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5073572A JPS549472B2 (en:Method) | 1972-05-24 | 1972-05-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5073572A JPS549472B2 (en:Method) | 1972-05-24 | 1972-05-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS498831A true JPS498831A (en:Method) | 1974-01-25 |
| JPS549472B2 JPS549472B2 (en:Method) | 1979-04-24 |
Family
ID=12867090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5073572A Expired JPS549472B2 (en:Method) | 1972-05-24 | 1972-05-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS549472B2 (en:Method) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56107489A (en) * | 1981-01-12 | 1981-08-26 | Asahi Glass Co Ltd | Heater for plate glass |
| JPS6119117A (ja) * | 1984-07-05 | 1986-01-28 | Toshiba Ceramics Co Ltd | シリコンウエハ−の連続ｃｖｄコ−テイング処理方法 |
| JPH01202814A (ja) * | 1988-02-09 | 1989-08-15 | Fujitsu Ltd | 間接加熱型半導体ウェーハ処理装置 |
-
1972
- 1972-05-24 JP JP5073572A patent/JPS549472B2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56107489A (en) * | 1981-01-12 | 1981-08-26 | Asahi Glass Co Ltd | Heater for plate glass |
| JPS6119117A (ja) * | 1984-07-05 | 1986-01-28 | Toshiba Ceramics Co Ltd | シリコンウエハ−の連続ｃｖｄコ−テイング処理方法 |
| JPH01202814A (ja) * | 1988-02-09 | 1989-08-15 | Fujitsu Ltd | 間接加熱型半導体ウェーハ処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS549472B2 (en:Method) | 1979-04-24 |