JPS4983764A - - Google Patents
Info
- Publication number
- JPS4983764A JPS4983764A JP12525272A JP12525272A JPS4983764A JP S4983764 A JPS4983764 A JP S4983764A JP 12525272 A JP12525272 A JP 12525272A JP 12525272 A JP12525272 A JP 12525272A JP S4983764 A JPS4983764 A JP S4983764A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12525272A JPS4983764A (en) | 1972-12-15 | 1972-12-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12525272A JPS4983764A (en) | 1972-12-15 | 1972-12-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4983764A true JPS4983764A (en) | 1974-08-12 |
Family
ID=14905505
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12525272A Pending JPS4983764A (en) | 1972-12-15 | 1972-12-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4983764A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5630729A (en) * | 1979-08-22 | 1981-03-27 | Yokogawa Hokushin Electric Corp | Formation of thin film pattern |
| JPS58125830A (en) * | 1982-01-22 | 1983-07-27 | Fujitsu Ltd | Plasma etching method |
| JPS58186937A (en) * | 1982-04-26 | 1983-11-01 | Hitachi Ltd | Dry etching method |
| JPS5947733A (en) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | Plasma processing apparatus |
| JPH02164441A (en) * | 1988-12-19 | 1990-06-25 | Teru Kyushu Kk | Plasma producing apparatus |
-
1972
- 1972-12-15 JP JP12525272A patent/JPS4983764A/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5630729A (en) * | 1979-08-22 | 1981-03-27 | Yokogawa Hokushin Electric Corp | Formation of thin film pattern |
| JPS58125830A (en) * | 1982-01-22 | 1983-07-27 | Fujitsu Ltd | Plasma etching method |
| JPS58186937A (en) * | 1982-04-26 | 1983-11-01 | Hitachi Ltd | Dry etching method |
| JPH0454373B2 (en) * | 1982-04-26 | 1992-08-31 | Hitachi Ltd | |
| JPS5947733A (en) * | 1982-09-13 | 1984-03-17 | Hitachi Ltd | Plasma processing apparatus |
| JPH0522378B2 (en) * | 1982-09-13 | 1993-03-29 | Hitachi Ltd | |
| JPH02164441A (en) * | 1988-12-19 | 1990-06-25 | Teru Kyushu Kk | Plasma producing apparatus |