JPS4972137A - - Google Patents

Info

Publication number
JPS4972137A
JPS4972137A JP11309372A JP11309372A JPS4972137A JP S4972137 A JPS4972137 A JP S4972137A JP 11309372 A JP11309372 A JP 11309372A JP 11309372 A JP11309372 A JP 11309372A JP S4972137 A JPS4972137 A JP S4972137A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11309372A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11309372A priority Critical patent/JPS4972137A/ja
Publication of JPS4972137A publication Critical patent/JPS4972137A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)
JP11309372A 1972-11-11 1972-11-11 Pending JPS4972137A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11309372A JPS4972137A (zh) 1972-11-11 1972-11-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11309372A JPS4972137A (zh) 1972-11-11 1972-11-11

Publications (1)

Publication Number Publication Date
JPS4972137A true JPS4972137A (zh) 1974-07-12

Family

ID=14603291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11309372A Pending JPS4972137A (zh) 1972-11-11 1972-11-11

Country Status (1)

Country Link
JP (1) JPS4972137A (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006012922A (ja) * 2004-06-22 2006-01-12 Nagoya Institute Of Technology 炭化ケイ素への電極形成方法、電極形成装置、電極を用いた半導体素子およびその製造方法
JP2007297714A (ja) * 2006-05-04 2007-11-15 Internatl Business Mach Corp <Ibm> 抵抗性半導体ウェハ上に薄膜を電気化学処理するための装置及び方法
JP2008057035A (ja) * 2006-06-05 2008-03-13 Rohm & Haas Electronic Materials Llc めっき方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006012922A (ja) * 2004-06-22 2006-01-12 Nagoya Institute Of Technology 炭化ケイ素への電極形成方法、電極形成装置、電極を用いた半導体素子およびその製造方法
JP2007297714A (ja) * 2006-05-04 2007-11-15 Internatl Business Mach Corp <Ibm> 抵抗性半導体ウェハ上に薄膜を電気化学処理するための装置及び方法
JP2008057035A (ja) * 2006-06-05 2008-03-13 Rohm & Haas Electronic Materials Llc めっき方法

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