JPS4972137A - - Google Patents
Info
- Publication number
- JPS4972137A JPS4972137A JP11309372A JP11309372A JPS4972137A JP S4972137 A JPS4972137 A JP S4972137A JP 11309372 A JP11309372 A JP 11309372A JP 11309372 A JP11309372 A JP 11309372A JP S4972137 A JPS4972137 A JP S4972137A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11309372A JPS4972137A (zh) | 1972-11-11 | 1972-11-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11309372A JPS4972137A (zh) | 1972-11-11 | 1972-11-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS4972137A true JPS4972137A (zh) | 1974-07-12 |
Family
ID=14603291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11309372A Pending JPS4972137A (zh) | 1972-11-11 | 1972-11-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS4972137A (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006012922A (ja) * | 2004-06-22 | 2006-01-12 | Nagoya Institute Of Technology | 炭化ケイ素への電極形成方法、電極形成装置、電極を用いた半導体素子およびその製造方法 |
JP2007297714A (ja) * | 2006-05-04 | 2007-11-15 | Internatl Business Mach Corp <Ibm> | 抵抗性半導体ウェハ上に薄膜を電気化学処理するための装置及び方法 |
JP2008057035A (ja) * | 2006-06-05 | 2008-03-13 | Rohm & Haas Electronic Materials Llc | めっき方法 |
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1972
- 1972-11-11 JP JP11309372A patent/JPS4972137A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006012922A (ja) * | 2004-06-22 | 2006-01-12 | Nagoya Institute Of Technology | 炭化ケイ素への電極形成方法、電極形成装置、電極を用いた半導体素子およびその製造方法 |
JP2007297714A (ja) * | 2006-05-04 | 2007-11-15 | Internatl Business Mach Corp <Ibm> | 抵抗性半導体ウェハ上に薄膜を電気化学処理するための装置及び方法 |
JP2008057035A (ja) * | 2006-06-05 | 2008-03-13 | Rohm & Haas Electronic Materials Llc | めっき方法 |