JPS497005A - - Google Patents

Info

Publication number
JPS497005A
JPS497005A JP4569372A JP4569372A JPS497005A JP S497005 A JPS497005 A JP S497005A JP 4569372 A JP4569372 A JP 4569372A JP 4569372 A JP4569372 A JP 4569372A JP S497005 A JPS497005 A JP S497005A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4569372A
Other languages
Japanese (ja)
Other versions
JPS5522781B2 (en:Method
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4569372A priority Critical patent/JPS5522781B2/ja
Priority to GB2221073A priority patent/GB1419643A/en
Priority to DE19732323453 priority patent/DE2323453A1/de
Publication of JPS497005A publication Critical patent/JPS497005A/ja
Publication of JPS5522781B2 publication Critical patent/JPS5522781B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP4569372A 1972-05-09 1972-05-09 Expired JPS5522781B2 (en:Method)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4569372A JPS5522781B2 (en:Method) 1972-05-09 1972-05-09
GB2221073A GB1419643A (en) 1972-05-09 1973-05-09 Positive working presensitized planographic printing plate precursor
DE19732323453 DE2323453A1 (de) 1972-05-09 1973-05-09 Vorsensibilisierte planographische druckplatten

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4569372A JPS5522781B2 (en:Method) 1972-05-09 1972-05-09

Publications (2)

Publication Number Publication Date
JPS497005A true JPS497005A (en:Method) 1974-01-22
JPS5522781B2 JPS5522781B2 (en:Method) 1980-06-19

Family

ID=12726449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4569372A Expired JPS5522781B2 (en:Method) 1972-05-09 1972-05-09

Country Status (3)

Country Link
JP (1) JPS5522781B2 (en:Method)
DE (1) DE2323453A1 (en:Method)
GB (1) GB1419643A (en:Method)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
JPS61153655A (ja) * 1984-12-27 1986-07-12 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JPH0668623B2 (ja) * 1986-02-13 1994-08-31 富士写真フイルム株式会社 水なし感光性平版印刷版
DE3627758A1 (de) * 1986-08-16 1988-02-18 Basf Ag Verfahren zur herstellung elektrophotographischer aufzeichnungselemente
DE3627757A1 (de) * 1986-08-16 1988-02-18 Basf Ag Verfahren zur herstellung von flachdruckplatten
JP3290313B2 (ja) 1994-09-07 2002-06-10 富士写真フイルム株式会社 湿し水不要感光性平版印刷版及びその製版方法
KR20140101609A (ko) * 2013-02-12 2014-08-20 삼성전자주식회사 전자 사진용 정착 부재

Also Published As

Publication number Publication date
JPS5522781B2 (en:Method) 1980-06-19
GB1419643A (en) 1975-12-31
DE2323453A1 (de) 1973-11-29

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