JPS497002A - - Google Patents

Info

Publication number
JPS497002A
JPS497002A JP4522372A JP4522372A JPS497002A JP S497002 A JPS497002 A JP S497002A JP 4522372 A JP4522372 A JP 4522372A JP 4522372 A JP4522372 A JP 4522372A JP S497002 A JPS497002 A JP S497002A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4522372A
Other languages
Japanese (ja)
Other versions
JPS516564B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4522372A priority Critical patent/JPS516564B2/ja
Priority to FR7316316A priority patent/FR2184315A5/fr
Priority to GB2172573A priority patent/GB1411695A/en
Priority to BE130835A priority patent/BE799201A/xx
Priority to DE19732323104 priority patent/DE2323104C3/de
Publication of JPS497002A publication Critical patent/JPS497002A/ja
Publication of JPS516564B2 publication Critical patent/JPS516564B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C3/00—Reproduction or duplicating of printing formes
    • B41C3/06—Reproduction or duplicating of printing formes to produce printing blocks from plastics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Inking, Control Or Cleaning Of Printing Machines (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP4522372A 1972-05-08 1972-05-08 Expired JPS516564B2 (enrdf_load_stackoverflow)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP4522372A JPS516564B2 (enrdf_load_stackoverflow) 1972-05-08 1972-05-08
FR7316316A FR2184315A5 (enrdf_load_stackoverflow) 1972-05-08 1973-05-07
GB2172573A GB1411695A (en) 1972-05-08 1973-05-07 Materials for use in printing
BE130835A BE799201A (en) 1972-05-08 1973-05-07 Microporous printing material - by photopolymerising a photopolymerisable resin soluble substance mixt and removing salt w
DE19732323104 DE2323104C3 (de) 1972-05-08 1973-05-08 Verfahren zum Herstellen einer mikroporösen Druckplatte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4522372A JPS516564B2 (enrdf_load_stackoverflow) 1972-05-08 1972-05-08

Publications (2)

Publication Number Publication Date
JPS497002A true JPS497002A (enrdf_load_stackoverflow) 1974-01-22
JPS516564B2 JPS516564B2 (enrdf_load_stackoverflow) 1976-02-28

Family

ID=12713256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4522372A Expired JPS516564B2 (enrdf_load_stackoverflow) 1972-05-08 1972-05-08

Country Status (2)

Country Link
JP (1) JPS516564B2 (enrdf_load_stackoverflow)
BE (1) BE799201A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53101416A (en) * 1976-12-23 1978-09-04 Heidenhain Gmbh Dr Johannes Recording material for reproducing high resolving pattern
JPS53151710U (enrdf_load_stackoverflow) * 1977-05-06 1978-11-29
JPS545292B1 (enrdf_load_stackoverflow) * 1970-06-11 1979-03-15
JPS622253A (ja) * 1985-06-19 1987-01-08 チバ−ガイギ−　アクチエンゲゼルシヤフト 画像形成方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS545292B1 (enrdf_load_stackoverflow) * 1970-06-11 1979-03-15
JPS53101416A (en) * 1976-12-23 1978-09-04 Heidenhain Gmbh Dr Johannes Recording material for reproducing high resolving pattern
JPS53151710U (enrdf_load_stackoverflow) * 1977-05-06 1978-11-29
JPS622253A (ja) * 1985-06-19 1987-01-08 チバ−ガイギ−　アクチエンゲゼルシヤフト 画像形成方法

Also Published As

Publication number Publication date
JPS516564B2 (enrdf_load_stackoverflow) 1976-02-28
BE799201A (en) 1973-08-31

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