JPS4962184A - - Google Patents

Info

Publication number
JPS4962184A
JPS4962184A JP48053039A JP5303973A JPS4962184A JP S4962184 A JPS4962184 A JP S4962184A JP 48053039 A JP48053039 A JP 48053039A JP 5303973 A JP5303973 A JP 5303973A JP S4962184 A JPS4962184 A JP S4962184A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48053039A
Other languages
Japanese (ja)
Other versions
JPS5637503B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4962184A publication Critical patent/JPS4962184A/ja
Publication of JPS5637503B2 publication Critical patent/JPS5637503B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP5303973A 1972-05-12 1973-05-11 Expired JPS5637503B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2223367A DE2223367C3 (de) 1972-05-12 1972-05-12 Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen

Publications (2)

Publication Number Publication Date
JPS4962184A true JPS4962184A (enrdf_load_stackoverflow) 1974-06-17
JPS5637503B2 JPS5637503B2 (enrdf_load_stackoverflow) 1981-09-01

Family

ID=5844786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5303973A Expired JPS5637503B2 (enrdf_load_stackoverflow) 1972-05-12 1973-05-11

Country Status (5)

Country Link
US (1) US3845305A (enrdf_load_stackoverflow)
JP (1) JPS5637503B2 (enrdf_load_stackoverflow)
DE (1) DE2223367C3 (enrdf_load_stackoverflow)
FR (1) FR2184713B1 (enrdf_load_stackoverflow)
GB (1) GB1426359A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227689A (ja) * 1995-02-22 1996-09-03 Nec Corp 二次イオン質量分析装置

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4205226A (en) * 1978-09-01 1980-05-27 The Perkin-Elmer Corporation Auger electron spectroscopy
DE2950329C2 (de) * 1979-12-14 1985-06-05 Leybold-Heraeus GmbH, 5000 Köln Einrichtung zum Abtragen von Material von der Oberfläche eines Targets
JPS56114269A (en) 1980-02-15 1981-09-08 Internatl Precision Inc Scanning type electronic microscope
US4491735A (en) * 1982-04-05 1985-01-01 The Perkin-Elmer Corporation Restricted ion source of high current density
DE3231036A1 (de) * 1982-08-20 1984-02-23 Max Planck Gesellschaft Kombinierte elektrostatische objektiv- und emissionslinse
DE3236273A1 (de) * 1982-09-30 1984-04-05 Siemens AG, 1000 Berlin und 8000 München Spektrometerobjektiv mit parallelen objektiv- und spektrometerfeldern fuer die potentialmesstechnik
DE3236271A1 (de) * 1982-09-30 1984-04-05 Siemens AG, 1000 Berlin und 8000 München Spektrometerobjektiv fuer die korpuskularstrahl-messtechnik
JPS6089050A (ja) * 1983-10-20 1985-05-18 Toshiba Corp ストロボ走査電子顕微鏡
DE3477710D1 (en) * 1984-02-18 1989-05-18 Leybold Ag Device for measuring the angular distribution of charged particles diffracted on a sample surface
DE3576213D1 (de) * 1984-09-18 1990-04-05 Integrated Circuit Testing Gegenfeld-spektrometer fuer die elektronenstrahl-messtechnik.
FR2575597B1 (fr) * 1984-12-28 1987-03-20 Onera (Off Nat Aerospatiale) Appareil pour la micro-analyse ionique a tres haute resolution d'un echantillon solide
US4556794A (en) * 1985-01-30 1985-12-03 Hughes Aircraft Company Secondary ion collection and transport system for ion microprobe
FR2584234B1 (fr) * 1985-06-28 1988-12-09 Cameca Testeur de circuit integre a faisceau d'electrons
US4889987A (en) * 1986-06-04 1989-12-26 Arch Development Corporation Photo ion spectrometer
US4864130A (en) * 1986-06-04 1989-09-05 Arch Development Corporation Photo ion spectrometer
US4855596A (en) * 1986-06-04 1989-08-08 Arch Development Corp. Photo ion spectrometer
DE3888712D1 (de) * 1987-02-02 1994-05-05 Integrated Circuit Testing Detektorobjectiv für Rastermikroskope.
US4818872A (en) * 1987-05-11 1989-04-04 Microbeam Inc. Integrated charge neutralization and imaging system
FR2624610B1 (fr) * 1987-12-11 1990-03-30 Cameca Procede d'analyse en temps de vol, a balayage continu, et dispositif d'analyse pour la mise en oeuvre de ce procede
DE3904032A1 (de) * 1989-02-10 1990-08-16 Max Planck Gesellschaft Elektronenmikroskop zur untersuchung von festkoerperoberflaechen
US4983830A (en) * 1989-06-29 1991-01-08 Seiko Instruments Inc. Focused ion beam apparatus having charged particle energy filter
DE4000579A1 (de) * 1990-01-10 1991-07-11 Integrated Circuit Testing Ionenstrahlgeraet sowie verfahren zur durchfuehrung von potentialmessungen mittels eines ionenstrahles
US5149974A (en) * 1990-10-29 1992-09-22 International Business Machines Corporation Gas delivery for ion beam deposition and etching
JP3730263B2 (ja) * 1992-05-27 2005-12-21 ケーエルエー・インストルメンツ・コーポレーション 荷電粒子ビームを用いた自動基板検査の装置及び方法
EP1130399B1 (en) * 1992-05-29 2009-04-01 The Rockefeller University Method for the sequence determination of peptides using a mass spectrometer
FR2806527B1 (fr) 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
EP1388883B1 (en) * 2002-08-07 2013-06-05 Fei Company Coaxial FIB-SEM column
JP4519567B2 (ja) * 2004-08-11 2010-08-04 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびこれを用いた試料観察方法
US7589322B2 (en) * 2005-06-29 2009-09-15 Horiba, Ltd. Sample measuring device
EP2027594B1 (en) 2005-07-08 2011-12-14 NexGen Semi Holding, Inc. Apparatus and method for controlled particle beam manufacturing of semiconductors
GB2428868B (en) * 2005-10-28 2008-11-19 Thermo Electron Corp Spectrometer for surface analysis and method therefor
WO2008140585A1 (en) 2006-11-22 2008-11-20 Nexgen Semi Holding, Inc. Apparatus and method for conformal mask manufacturing
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
FR2960698B1 (fr) * 2010-05-27 2013-05-10 Centre Nat Rech Scient Systeme de detection de cathodoluminescence reglable et microscope mettant en oeuvre un tel systeme.
JP7444481B2 (ja) 2019-05-09 2024-03-06 アットライト エージー カソードルミネッセンス電子顕微鏡
US11227743B2 (en) 2019-08-20 2022-01-18 Attolight AG Accurate wavelength calibration in cathodoluminescence SEM
US11782001B2 (en) 2020-12-04 2023-10-10 Attolight AG Dislocation type and density discrimination in semiconductor materials using cathodoluminescence measurements
TWI808554B (zh) 2020-12-04 2023-07-11 亞光股份有限公司 使用陰極發光測量判別半導體材料中的位錯類型和密度的裝置與方法
JP7650540B2 (ja) 2021-01-19 2025-03-25 アットライト エージー μＬＥＤの大量生産における費用対効果が高いプロービング

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL53866C (enrdf_load_stackoverflow) * 1937-09-11
US2356535A (en) * 1940-08-31 1944-08-22 Ruska Ernst Electronic lens
US2330930A (en) * 1941-04-30 1943-10-05 Rca Corp Scanning type of electron microscope
DE1133841B (de) * 1957-09-11 1962-07-26 Leitz Ernst Gmbh Elektronenmikroskop zur direkten Abbildung von Oberflaechen durch Sekundaerelektronen, Verfahren zur Untersuchung von Nichtleitern oder Halbleitern und Anordnung zur Durchfuehrung des Verfahrens
US3253144A (en) * 1963-05-27 1966-05-24 Tektronix Inc Electron lens having means for correcting astigmatism
NL154050B (nl) * 1966-08-13 1977-07-15 Philips Nv Elektronenmicroscoop.
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
US3374349A (en) * 1966-11-14 1968-03-19 Victor G. Macres Electron probe having a specific shortfocal length magnetic lens and light microscope
DE1614126B1 (de) * 1967-02-27 1970-11-19 Max Planck Gesellschaft Korpuskularstrahlmikroskop,insbesondere Elektronenmikroskop,mit einer durch das Vorfeld einer Objektivlinse gebildeten Kondensorlinse und einer Bereichsblende

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227689A (ja) * 1995-02-22 1996-09-03 Nec Corp 二次イオン質量分析装置

Also Published As

Publication number Publication date
JPS5637503B2 (enrdf_load_stackoverflow) 1981-09-01
FR2184713A1 (enrdf_load_stackoverflow) 1973-12-28
DE2223367C3 (de) 1978-11-30
DE2223367B2 (de) 1978-03-30
US3845305A (en) 1974-10-29
GB1426359A (en) 1976-02-25
FR2184713B1 (enrdf_load_stackoverflow) 1974-05-17
DE2223367A1 (de) 1973-11-29

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