JPS4958770A - - Google Patents

Info

Publication number
JPS4958770A
JPS4958770A JP47099004A JP9900472A JPS4958770A JP S4958770 A JPS4958770 A JP S4958770A JP 47099004 A JP47099004 A JP 47099004A JP 9900472 A JP9900472 A JP 9900472A JP S4958770 A JPS4958770 A JP S4958770A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP47099004A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47099004A priority Critical patent/JPS4958770A/ja
Publication of JPS4958770A publication Critical patent/JPS4958770A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP47099004A 1972-10-04 1972-10-04 Pending JPS4958770A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP47099004A JPS4958770A (ja) 1972-10-04 1972-10-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47099004A JPS4958770A (ja) 1972-10-04 1972-10-04

Publications (1)

Publication Number Publication Date
JPS4958770A true JPS4958770A (ja) 1974-06-07

Family

ID=14234851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47099004A Pending JPS4958770A (ja) 1972-10-04 1972-10-04

Country Status (1)

Country Link
JP (1) JPS4958770A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5543844A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Method and apparatus for photoresist sensitizing process
JPS5543865A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Mask aligner
JPS59200241A (ja) * 1983-04-28 1984-11-13 Hoya Corp コンタクトプリンタ

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5543844A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Method and apparatus for photoresist sensitizing process
JPS5543865A (en) * 1978-09-25 1980-03-27 Hitachi Ltd Mask aligner
JPS59200241A (ja) * 1983-04-28 1984-11-13 Hoya Corp コンタクトプリンタ

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