JPS4940874A - - Google Patents
Info
- Publication number
- JPS4940874A JPS4940874A JP8455872A JP8455872A JPS4940874A JP S4940874 A JPS4940874 A JP S4940874A JP 8455872 A JP8455872 A JP 8455872A JP 8455872 A JP8455872 A JP 8455872A JP S4940874 A JPS4940874 A JP S4940874A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8455872A JPS4940874A (en:Method) | 1972-08-25 | 1972-08-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8455872A JPS4940874A (en:Method) | 1972-08-25 | 1972-08-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4940874A true JPS4940874A (en:Method) | 1974-04-17 |
Family
ID=13833958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8455872A Pending JPS4940874A (en:Method) | 1972-08-25 | 1972-08-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS4940874A (en:Method) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5259580A (en) * | 1975-11-11 | 1977-05-17 | Matsushita Electric Ind Co Ltd | Photo etching method |
| JPS5376757A (en) * | 1976-12-20 | 1978-07-07 | Oki Electric Ind Co Ltd | Photoetching method |
| JPS5389673A (en) * | 1977-01-19 | 1978-08-07 | Oki Electric Ind Co Ltd | Fine pattern forming method of semiconductor device |
| JPS56111226A (en) * | 1980-02-07 | 1981-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
| JPS60161622A (ja) * | 1984-02-02 | 1985-08-23 | Rohm Co Ltd | 半導体装置の製造方法 |
| JPH0851067A (ja) * | 1995-03-31 | 1996-02-20 | Tokyo Electron Ltd | 処理装置及び処理方法 |
-
1972
- 1972-08-25 JP JP8455872A patent/JPS4940874A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5259580A (en) * | 1975-11-11 | 1977-05-17 | Matsushita Electric Ind Co Ltd | Photo etching method |
| JPS5376757A (en) * | 1976-12-20 | 1978-07-07 | Oki Electric Ind Co Ltd | Photoetching method |
| JPS5389673A (en) * | 1977-01-19 | 1978-08-07 | Oki Electric Ind Co Ltd | Fine pattern forming method of semiconductor device |
| JPS56111226A (en) * | 1980-02-07 | 1981-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
| JPS60161622A (ja) * | 1984-02-02 | 1985-08-23 | Rohm Co Ltd | 半導体装置の製造方法 |
| JPH0851067A (ja) * | 1995-03-31 | 1996-02-20 | Tokyo Electron Ltd | 処理装置及び処理方法 |