JPS4931716A - - Google Patents
Info
- Publication number
- JPS4931716A JPS4931716A JP7347472A JP7347472A JPS4931716A JP S4931716 A JPS4931716 A JP S4931716A JP 7347472 A JP7347472 A JP 7347472A JP 7347472 A JP7347472 A JP 7347472A JP S4931716 A JPS4931716 A JP S4931716A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7347472A JPS568495B2 (ja) | 1972-07-24 | 1972-07-24 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7347472A JPS568495B2 (ja) | 1972-07-24 | 1972-07-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4931716A true JPS4931716A (ja) | 1974-03-22 |
JPS568495B2 JPS568495B2 (ja) | 1981-02-24 |
Family
ID=13519295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7347472A Expired JPS568495B2 (ja) | 1972-07-24 | 1972-07-24 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS568495B2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50154067A (ja) * | 1974-05-31 | 1975-12-11 | ||
US4999083A (en) * | 1988-10-02 | 1991-03-12 | Canon Kabushiki Kaisha | Method of etching crystalline material with etchant injection inlet |
WO2006085367A1 (ja) * | 2005-02-09 | 2006-08-17 | Fujitsu Limited | 半導体装置の製造方法 |
JPWO2005013374A1 (ja) * | 2003-08-05 | 2006-09-28 | 富士通株式会社 | 半導体装置および半導体装置の製造方法 |
-
1972
- 1972-07-24 JP JP7347472A patent/JPS568495B2/ja not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50154067A (ja) * | 1974-05-31 | 1975-12-11 | ||
US4999083A (en) * | 1988-10-02 | 1991-03-12 | Canon Kabushiki Kaisha | Method of etching crystalline material with etchant injection inlet |
JPWO2005013374A1 (ja) * | 2003-08-05 | 2006-09-28 | 富士通株式会社 | 半導体装置および半導体装置の製造方法 |
WO2006085367A1 (ja) * | 2005-02-09 | 2006-08-17 | Fujitsu Limited | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS568495B2 (ja) | 1981-02-24 |