JPS4929986A - - Google Patents
Info
- Publication number
- JPS4929986A JPS4929986A JP47072761A JP7276172A JPS4929986A JP S4929986 A JPS4929986 A JP S4929986A JP 47072761 A JP47072761 A JP 47072761A JP 7276172 A JP7276172 A JP 7276172A JP S4929986 A JPS4929986 A JP S4929986A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Element Separation (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7276172A JPS5548455B2 (en:Method) | 1972-07-19 | 1972-07-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7276172A JPS5548455B2 (en:Method) | 1972-07-19 | 1972-07-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4929986A true JPS4929986A (en:Method) | 1974-03-16 |
| JPS5548455B2 JPS5548455B2 (en:Method) | 1980-12-05 |
Family
ID=13498655
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7276172A Expired JPS5548455B2 (en:Method) | 1972-07-19 | 1972-07-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5548455B2 (en:Method) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5637642A (en) * | 1979-09-04 | 1981-04-11 | Nec Corp | Semiconductor device |
| JPS5643723A (en) * | 1979-09-18 | 1981-04-22 | Nec Corp | Manufacture of semiconductor element |
| JPS5667966A (en) * | 1979-11-07 | 1981-06-08 | Nec Corp | Semiconductor device and preparation method thereof |
| JPS56101757A (en) * | 1980-01-18 | 1981-08-14 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
| JPS574124A (en) * | 1980-06-10 | 1982-01-09 | Fujitsu Ltd | Manufacture of germanium semiconductor device |
| JPS57106111U (en:Method) * | 1980-12-20 | 1982-06-30 | ||
| JPS57106131A (en) * | 1980-12-24 | 1982-07-01 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS6431413A (en) * | 1987-07-28 | 1989-02-01 | Matsushita Electronics Corp | Measurement of pattern shift during epitaxial growth |
| JP2001307999A (ja) * | 2000-04-27 | 2001-11-02 | Oki Electric Ind Co Ltd | アライメントマークの構造およびその製造方法 |
-
1972
- 1972-07-19 JP JP7276172A patent/JPS5548455B2/ja not_active Expired
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5637642A (en) * | 1979-09-04 | 1981-04-11 | Nec Corp | Semiconductor device |
| JPS5643723A (en) * | 1979-09-18 | 1981-04-22 | Nec Corp | Manufacture of semiconductor element |
| JPS5667966A (en) * | 1979-11-07 | 1981-06-08 | Nec Corp | Semiconductor device and preparation method thereof |
| JPS56101757A (en) * | 1980-01-18 | 1981-08-14 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
| JPS574124A (en) * | 1980-06-10 | 1982-01-09 | Fujitsu Ltd | Manufacture of germanium semiconductor device |
| JPS57106111U (en:Method) * | 1980-12-20 | 1982-06-30 | ||
| JPS57106131A (en) * | 1980-12-24 | 1982-07-01 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS6431413A (en) * | 1987-07-28 | 1989-02-01 | Matsushita Electronics Corp | Measurement of pattern shift during epitaxial growth |
| JP2001307999A (ja) * | 2000-04-27 | 2001-11-02 | Oki Electric Ind Co Ltd | アライメントマークの構造およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5548455B2 (en:Method) | 1980-12-05 |