JPS492482A - - Google Patents
Info
- Publication number
- JPS492482A JPS492482A JP3885572A JP3885572A JPS492482A JP S492482 A JPS492482 A JP S492482A JP 3885572 A JP3885572 A JP 3885572A JP 3885572 A JP3885572 A JP 3885572A JP S492482 A JPS492482 A JP S492482A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3885572A JPS529353B2 (pt) | 1972-04-18 | 1972-04-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3885572A JPS529353B2 (pt) | 1972-04-18 | 1972-04-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS492482A true JPS492482A (pt) | 1974-01-10 |
| JPS529353B2 JPS529353B2 (pt) | 1977-03-15 |
Family
ID=12536801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3885572A Expired JPS529353B2 (pt) | 1972-04-18 | 1972-04-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS529353B2 (pt) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5135639A (ja) * | 1974-09-20 | 1976-03-26 | Hitachi Ltd | Himakunopurazumaetsuchingushorishutenkenshutsuho |
| JPS5188181A (pt) * | 1975-01-20 | 1976-08-02 | ||
| JPS5211176A (en) * | 1975-07-18 | 1977-01-27 | Toshiba Corp | Activation gas reaction apparatus |
| JPS5334641A (en) * | 1976-09-13 | 1978-03-31 | Northern Telecom Ltd | Method of and apparatus for controlling terminal point of plasma etching |
| JPS5384466A (en) * | 1976-12-29 | 1978-07-25 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS5521596A (en) * | 1978-07-31 | 1980-02-15 | Western Electric Co | Article production by plasma etching |
| JPS56105631A (en) * | 1980-01-25 | 1981-08-22 | Mitsubishi Electric Corp | Electrode formation of semiconductor device |
| JPS62145732A (ja) * | 1985-12-20 | 1987-06-29 | Hitachi Ltd | エツチング法 |
-
1972
- 1972-04-18 JP JP3885572A patent/JPS529353B2/ja not_active Expired
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5424697B2 (pt) * | 1974-09-20 | 1979-08-23 | ||
| JPS5135639A (ja) * | 1974-09-20 | 1976-03-26 | Hitachi Ltd | Himakunopurazumaetsuchingushorishutenkenshutsuho |
| JPS5188181A (pt) * | 1975-01-20 | 1976-08-02 | ||
| JPS5421711B2 (pt) * | 1975-01-20 | 1979-08-01 | ||
| JPS5211176A (en) * | 1975-07-18 | 1977-01-27 | Toshiba Corp | Activation gas reaction apparatus |
| JPS5441552B2 (pt) * | 1975-07-18 | 1979-12-08 | ||
| JPS5334641A (en) * | 1976-09-13 | 1978-03-31 | Northern Telecom Ltd | Method of and apparatus for controlling terminal point of plasma etching |
| JPS6013072B2 (ja) * | 1976-09-13 | 1985-04-04 | ノ−ザン・テレコム・リミテツド | プラズマエツチングの終点制御方法および装置 |
| JPS5384466A (en) * | 1976-12-29 | 1978-07-25 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS617742B2 (pt) * | 1976-12-29 | 1986-03-08 | Matsushita Electric Ind Co Ltd | |
| JPS5521596A (en) * | 1978-07-31 | 1980-02-15 | Western Electric Co | Article production by plasma etching |
| JPS56105631A (en) * | 1980-01-25 | 1981-08-22 | Mitsubishi Electric Corp | Electrode formation of semiconductor device |
| JPS62145732A (ja) * | 1985-12-20 | 1987-06-29 | Hitachi Ltd | エツチング法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS529353B2 (pt) | 1977-03-15 |