JPS4922863A - - Google Patents

Info

Publication number
JPS4922863A
JPS4922863A JP48030198A JP3019873A JPS4922863A JP S4922863 A JPS4922863 A JP S4922863A JP 48030198 A JP48030198 A JP 48030198A JP 3019873 A JP3019873 A JP 3019873A JP S4922863 A JPS4922863 A JP S4922863A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48030198A
Other versions
JPS538472B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4922863A publication Critical patent/JPS4922863A/ja
Publication of JPS538472B2 publication Critical patent/JPS538472B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/023—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance where the material is placed in the field of a coil
JP3019873A 1972-04-25 1973-03-16 Expired JPS538472B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00247489A US3805160A (en) 1972-04-25 1972-04-25 Method for non-contact semiconductor resistivity measurement

Publications (2)

Publication Number Publication Date
JPS4922863A true JPS4922863A (ja) 1974-02-28
JPS538472B2 JPS538472B2 (ja) 1978-03-29

Family

ID=22935126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3019873A Expired JPS538472B2 (ja) 1972-04-25 1973-03-16

Country Status (5)

Country Link
US (1) US3805160A (ja)
JP (1) JPS538472B2 (ja)
CA (1) CA978257A (ja)
DE (1) DE2315795A1 (ja)
FR (1) FR2181841B1 (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3953796A (en) * 1973-06-05 1976-04-27 Siemens Aktiengesellschaft Method and apparatus for measuring electrical conductivity
JPS5491049A (en) * 1977-12-12 1979-07-19 Ibm Method of nonndestructively measuring immersion oxygen content into silicon wafer having no junction
US4342616A (en) * 1981-02-17 1982-08-03 International Business Machines Corporation Technique for predicting oxygen precipitation in semiconductor wafers
US4646009A (en) * 1982-05-18 1987-02-24 Ade Corporation Contacts for conductivity-type sensors
US4797614A (en) * 1984-11-02 1989-01-10 Sierracin Corporation Apparatus and method for measuring conductance including a temperature controlled resonant tank circuit with shielding
JP2921916B2 (ja) * 1989-11-17 1999-07-19 株式会社東芝 半導体ウェーハ評価装置
US5508610A (en) * 1992-12-03 1996-04-16 Georgia Tech Research Corporation Electrical conductivity tester and methods thereof for accurately measuring time-varying and steady state conductivity using phase shift detection
US5420518A (en) * 1993-09-23 1995-05-30 Schafer, Jr.; Kenneth L. Sensor and method for the in situ monitoring and control of microstructure during rapid metal forming processes
US5929652A (en) * 1997-09-02 1999-07-27 Midwest Research Institute Apparatus for measuring minority carrier lifetimes in semiconductor materials
US6267662B1 (en) 1999-04-13 2001-07-31 Mars Incorporated Measuring a stack of coins in a coin handling device
US6844747B2 (en) * 2001-03-19 2005-01-18 International Business Machines Corporation Wafer level system for producing burn-in/screen, and reliability evaluations to be performed on all chips simultaneously without any wafer contacting
US6809542B2 (en) * 2002-10-03 2004-10-26 Mti Instruments Inc. Wafer resistance measurement apparatus and method using capacitively coupled AC excitation signal
DE102007040650B4 (de) * 2007-08-27 2010-01-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur induktiven Messung eines Schichtwiderstandes einer in einen multikristallinen Halbleiterwafer eingebrachten Dotierungsschicht
CN110749773B (zh) * 2019-10-31 2021-09-07 深圳供电局有限公司 直流微电阻测量方法及装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2018080A (en) * 1934-07-09 1935-10-22 Martienssen Oscar Method of and device for differentiating between geologic strata traversed by bore holes
US2505778A (en) * 1946-08-16 1950-05-02 John P Limbach Device for determining moisture content, density, and direction of grain of wood, and other semiconducting material
US2859407A (en) * 1956-03-27 1958-11-04 Sylvania Electric Prod Method and device for measuring semiconductor parameters
US3234461A (en) * 1960-12-05 1966-02-08 Texas Instruments Inc Resistivity-measuring device including solid inductive sensor
US3234458A (en) * 1960-11-28 1966-02-08 Gen Electric Method for determining resistivity of a metal
FR1596799A (ja) * 1968-12-04 1970-06-22

Also Published As

Publication number Publication date
FR2181841A1 (ja) 1973-12-07
FR2181841B1 (ja) 1977-08-05
JPS538472B2 (ja) 1978-03-29
DE2315795A1 (de) 1973-11-08
US3805160A (en) 1974-04-16
CA978257A (en) 1975-11-18

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