JPS4922386A - - Google Patents

Info

Publication number
JPS4922386A
JPS4922386A JP6206972A JP6206972A JPS4922386A JP S4922386 A JPS4922386 A JP S4922386A JP 6206972 A JP6206972 A JP 6206972A JP 6206972 A JP6206972 A JP 6206972A JP S4922386 A JPS4922386 A JP S4922386A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6206972A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6206972A priority Critical patent/JPS4922386A/ja
Priority to US331494A priority patent/US3900585A/en
Publication of JPS4922386A publication Critical patent/JPS4922386A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP6206972A 1972-02-12 1972-06-21 Pending JPS4922386A (cg-RX-API-DMAC7.html)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP6206972A JPS4922386A (cg-RX-API-DMAC7.html) 1972-06-21 1972-06-21
US331494A US3900585A (en) 1972-02-12 1973-02-12 Method for control of ionization electrostatic plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6206972A JPS4922386A (cg-RX-API-DMAC7.html) 1972-06-21 1972-06-21

Publications (1)

Publication Number Publication Date
JPS4922386A true JPS4922386A (cg-RX-API-DMAC7.html) 1974-02-27

Family

ID=13189423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6206972A Pending JPS4922386A (cg-RX-API-DMAC7.html) 1972-02-12 1972-06-21

Country Status (1)

Country Link
JP (1) JPS4922386A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5247535U (cg-RX-API-DMAC7.html) * 1975-09-30 1977-04-04
JPS61235578A (ja) * 1986-01-06 1986-10-20 Semiconductor Energy Lab Co Ltd 反応炉内を清浄にする方法
JPH06331516A (ja) * 1993-05-24 1994-12-02 Akira Tanaka 直流グロー放電による金属被膜の堆積法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5247535U (cg-RX-API-DMAC7.html) * 1975-09-30 1977-04-04
JPS61235578A (ja) * 1986-01-06 1986-10-20 Semiconductor Energy Lab Co Ltd 反応炉内を清浄にする方法
JPH06331516A (ja) * 1993-05-24 1994-12-02 Akira Tanaka 直流グロー放電による金属被膜の堆積法

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